TiAlN/TiSiNiN composite coating, hard coating and preparation method and application of TiAlN/TiSiNiN composite coating
A composite coating and hard coating technology, applied in coating, metal material coating process, turning equipment, etc., can solve the problems of poor fracture toughness, inability to prepare thick coating, and fracture toughness coating is easy to collapse.
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[0044] Another aspect of the present invention provides the preparation method of the aforementioned TiAlN / TiSiNiN composite coating, comprising the following steps:
[0045] A substrate is provided, and a TiAlN / TiSiNiN composite coating is vapor-phase deposited on the substrate.
[0046] Another aspect of the present invention also provides a hard coating, which includes a transition layer and the aforementioned TiAlN / TiSiNiN composite coating, where the transition layer is a TiN transition layer and / or a TiAlN transition layer.
[0047] In some embodiments, the transition layer has a thickness of 0.1 μm to 1.5 μm.
[0048] In some embodiments, the transition layer is a TiN transition layer and a TiAlN transition layer, wherein the thickness of the TiN transition layer is 0.1 μm to 0.5 μm, and the thickness of the TiAlN transition layer is 0.2 μm to 1 μm. Preferably, the thickness of the TiN transition layer is 0.1 μm˜0.3 μm, and the thickness of the TiAlN transition layer i...
Embodiment 1
[0084] a). Put the polished milling cutter into an ultrasonic cleaning machine, ultrasonically clean it with acetone and alcohol in turn, then dry it with hot air, and put it into the vacuum chamber of the coating equipment;
[0085] b). Vacuumize the vacuum chamber of the coating equipment so that the pressure in the vacuum chamber is 3.0×10 -3 Pa; Turn on the heater in the vacuum chamber to raise the temperature in the vacuum chamber to 450°C, then pass in argon gas, adjust the pressure in the vacuum chamber to 0.8Pa, turn on the bias power of the workpiece turret and set it to -210V, and then turn on the arc enhancement glow Photodischarge power supply, argon ion etching cleaning on the surface of the milling cutter, cleaning time is 40min;
[0086] c). Adjust the bias voltage of the milling cutter to -100V, feed nitrogen and control the air pressure to 2.8Pa, turn on the pure Ti target arc source, and deposit the TiN layer, the deposition time is 20min, and the deposition ...
Embodiment 2
[0090] Example 2 is basically the same as Example 1, except that in step d), the mass percentages of elements in the TiSiNiN layer are: Ti: 35%, Si: 12%, Ni: 3%, and N: 50%.
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