Evaporator with double-sided arched flexible carbon film and preparation method thereof
An evaporator, arched technology, applied in the field of evaporator with double-sided arched flexible carbon film and its preparation, to achieve high evaporation rate, strong capillary action, and solve energy problems
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[0029] The invention provides a method for preparing an evaporator with a double-sided arched flexible carbon film. The specific steps are as follows:
[0030] 1. Preparation of Double-sided Arched Flexible Carbon Membrane
[0031] (1) First cut the carbon cloth into the desired size (for example, 2*3cm), and then wash it with acetone, ethanol solution and deionized water for 10 minutes to clean the carbon cloth.
[0032] (2) After drying in air, put the carbon cloth into the magnetron sputtering system (560C). With a DC power supply as the sputtering source, the vacuum degree of the sputtering chamber was pumped to 9.0×10-4Pa through a mechanical pump and a molecular pump in turn, and then argon gas (100sccm) was introduced, and the pressure in the vacuum chamber was adjusted to 0.6Pa . The sputtering process uses a high-purity copper target (99.9%), and pre-sputters for 15 minutes before sputtering to remove oxides on the copper surface. Afterwards, sputtering was perform...
Embodiment 1
[0039] 1. Preparation of Double-sided Arched Flexible Carbon Membrane
[0040](1) First cut the carbon cloth into the required size (2*3cm), and then wash it with acetone, ethanol solution and deionized water for 10 minutes to clean the carbon cloth.
[0041] (2) After drying in air, put the carbon cloth into the magnetron sputtering system (560C). With a DC power supply as the sputtering source, the vacuum degree of the sputtering chamber was pumped to 9.0×10-4Pa through a mechanical pump and a molecular pump in turn, and then argon gas (100sccm) was introduced, and the pressure in the vacuum chamber was adjusted to 0.6Pa . The sputtering process uses a high-purity copper target (99.9%), and pre-sputters for 15 minutes before sputtering to remove oxides on the copper surface. Afterwards, sputtering was performed for 30 min under the condition that the flow rate of argon gas was 0.5 and the power was 65 W, so that the sputtered copper was uniformly deposited on the carbon fi...
Embodiment 2
[0048] 1. Preparation of double-sided arched flexible carbon film (1) First cut the carbon cloth into the required size (2*3cm), and then wash it with acetone, ethanol solution and deionized water for 10 minutes to clean the carbon cloth.
[0049] (2) After drying in air, put the carbon cloth into the magnetron sputtering system (560C). With a DC power supply as the sputtering source, the vacuum degree of the sputtering chamber was pumped to 9.0×10-4Pa through a mechanical pump and a molecular pump in turn, and then argon gas (100sccm) was introduced, and the pressure in the vacuum chamber was adjusted to 0.6Pa . The sputtering process uses a high-purity copper target (99.9%), and pre-sputters for 15 minutes before sputtering to remove oxides on the copper surface. Afterwards, sputtering was performed for 30 min under the condition of an argon gas flow rate of 100 Å and a power of 70 W, so that the sputtered copper was uniformly deposited on the carbon fibers. Then change th...
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Abstract
Description
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Application Information

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