Evaporator with double-sided arched flexible carbon film and preparation method thereof
An evaporator, arched technology, applied in the field of evaporator with double-sided arched flexible carbon film and its preparation, to achieve high evaporation rate, strong capillary action, and solve energy problems
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[0029] The present invention provides a method of preparing a evaporator having a double-sided arched flexible carbon film, and the specific steps are as follows:
[0030] 1. Preparation of double-sided arched flexible carbon film
[0031] (1) First, the carbon cloth is cut into the desired size (for example, 2 * 3 cm), and then washed with acetone, ethanol solution, and deionized water to clean the carbon cloth.
[0032] (2) After drying in the air, place the carbon cloth into the magnetron sputter system (560C). With a DC power supply as a sputter source, the sputtering chamber is pumped into 9.0 × 10-4Pa by mechanical pump and molecular pump, then the argon (100 Sccm) is introduced, and the pressure in the vacuum chamber is adjusted to 0.6 Pa. . The sputtering process uses a high purity copper target (99.9%), pre-sputtering pre-sputtering for 15 min to remove the oxide of the copper surface. After the argon flow rate is 30 min, sputtering 30 min is sputtered under conditions ha...
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[0038] Example 1
[0039] 1. Preparation of double-sided arched flexible carbon film
[0040](1) First, the carbon cloth is cut into the desired size (2 * 3 cm), and then washed with acetone, ethanol solution, and deionized water to clean the carbon cloth.
[0041] (2) After drying in the air, place the carbon cloth into the magnetron sputter system (560C). With a DC power supply as a sputter source, the sputtering chamber is pumped into 9.0 × 10-4Pa by mechanical pump and molecular pump, then the argon (100 Sccm) is introduced, and the pressure in the vacuum chamber is adjusted to 0.6 Pa. . The sputtering process uses a high purity copper target (99.9%), pre-sputtering pre-sputtering for 15 min to remove the oxide of the copper surface. After the argon flow is 30 min, sputtering 30 min is sputtered under conditions having a power of 65 W, so that the sputtered copper is uniformly deposited on carbon fiber. Then change the carbon cloth on the other side, repeat the above steps, co...
Example Embodiment
[0047] Example 2
[0048] 1. Preparation of double-sided arched flexible carbon films (1) first cut the carbon cloth into the desired size (2 * 3 cm), and then washed with acetone, ethanol solution, and deionized water to clean the carbon cloth.
[0049] (2) After drying in the air, place the carbon cloth into the magnetron sputter system (560C). With a DC power supply as a sputter source, the sputtering chamber is pumped into 9.0 × 10-4Pa by mechanical pump and molecular pump, then the argon (100 Sccm) is introduced, and the pressure in the vacuum chamber is adjusted to 0.6 Pa. . The sputtering process uses a high purity copper target (99.9%), pre-sputtering pre-sputtering for 15 min to remove the oxide of the copper surface. Then, 30 min was sputtered under the conditions of the argon flow of 70 W, so that the sputtered copper was uniformly deposited on carbon fiber. Then change the carbon cloth on the other side, repeat the above steps, cover the uniform copper on both sides of...
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