Film containing nested micro trap structure and preparation method thereof

Abstract

The invention discloses a film containing a nested micro trap structure and a preparation method thereof. The film comprises a lower-layer material film, an upper-layer material film and a substrate, wherein the lower-layer material film is arranged on the substrate, and the upper-layer material film is arranged on the lower-layer material film; the atomic gap of the lower-layer material film is smaller than the atomic gap of the upper-layer material film, and the atomic gap of the lower-layer material film is nested into the atomic gap of the upper-layer material film to form a nested micro-trap structure. According to the invention, the film with the nested micro-trap structure is grown by using the magnetron sputtering technology, the upper and lower layers of films with different densities are formed by controlling the sputtering power, the lower-layer film is small in sputtering power, large in material density and small in atomic spacing, and small gaps exist between atoms; the upper-layer film is high in sputtering power, low in material density and large in atom spacing, large gaps exist among atoms, and the large gaps and the small gaps of the upper layer and the lower layer form a nested micro trap structure.

Description

technical field [0001] The invention belongs to the technical field of secondary electron emission suppression, and in particular relates to a thin film containing a nested micro-trap structure and a preparation method thereof. Background technique [0002] my country's spacecraft payload urgently needs to develop towards integration and high power. However, in the harsh space environment, it will also lead to the intensification of some special effects in space. The micro-discharge effect of space high-power microwave components is the first problem. The space micro-discharge effect, also known as the secondary electron multiplication effect, refers to the resonant discharge phenomenon that occurs when high-power microwave components transmit high-power microwave signals at a pressure of 1×10-3Pa or lower. The micro-discharge effect is a very important factor affecting the reliability of aerospace electronic equipment. Due to the rapid development of space electronic equip...

AI Technical Summary

Problems solved by technology

The secondary electron multiplication effect can lead to the gradual increase of the standing wave ratio of the microwave transmission system, the increase of the reflected power, and the increase of the noise level, resulting in the failure of the high-power microwave system to work normally; micro-discharge can also cause intracavity tuning, parameter coupling, waveguide Fluctuations in loss and phase constants, etc., generate harmonics that cause out-of-band interference and passive intermodulation products, and cause erosion on the surface of components, etc.

However, the single method of changing the surface morphology of the material has a non-negligible impact on the performance of the material itself. Although it plays a certain role in the suppression of secondary electrons, it affects the performance of the device in other ways.

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