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Double-helix curled micro-cavity plasma device structure and preparation method thereof

A plasma and device structure technology, applied in the direction of plasma and electrical components, can solve the problems of large device power loss and small device discharge area, and achieve the effect of large discharge area, improved discharge efficiency, and uniform thickness

Active Publication Date: 2021-12-03
XI AN JIAOTONG UNIV
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Problems solved by technology

[0004] In order to overcome the above-mentioned shortcomings of the prior art, the object of the present invention is to provide a double-helix coiled microcavity plasma device structure and its preparation method to solve the problems of small discharge area and large power loss of the existing device

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  • Double-helix curled micro-cavity plasma device structure and preparation method thereof
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  • Double-helix curled micro-cavity plasma device structure and preparation method thereof

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[0033] In order to enable those skilled in the art to better understand the solutions of the present invention, the following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only It is an embodiment of a part of the present invention, but not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts shall fall within the protection scope of the present invention.

[0034] It should be noted that the terms "first" and "second" in the description and claims of the present invention and the above drawings are used to distinguish similar objects, but not necessarily used to describe a specific sequence or sequence. It is to be understood that the data so used are interchangeable under appropriate ...

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Abstract

The invention discloses a double-helix curled micro-cavity plasma device structure and a preparation method thereof, belongs to the field of structural design of gas purification devices, and aims to solve the problems of small discharge area and large power loss of an existing counter electrode structure device. According to a double-helix curled micro-cavity plasma device of the structure, a spirally-curled aluminum base and a spirally-curled copper sheet are used as discharge units, and a discharge space is a space formed between the double-spiral pole pieces which are parallel to each other. The device comprises the spirally-curled aluminum base, the spirally-curled copper sheet and a glass tube barrier, and generates micro-cavity plasma in a gas discharge mode. The double-helix curled micro-cavity plasma device structure can be applied to the field of environmental protection, is a novel micro-cavity device which is free of pollution, high in efficiency, small in size and good in stability, and has important scientific significance in development of the fields of environmental protection and the like.

Description

technical field [0001] The invention belongs to the field of gas purification device structure design, and relates to a double-helix coiled microcavity plasma device structure and a preparation method thereof. Background technique [0002] Microcavity plasma has high current density, high power density, and quasi-neutral deviation, and has the characteristics of weak ionization, boundary-dominated phenomena, and high particle concentration. It can stably generate active particles and photons under different atmospheric pressure conditions. The application of microcavity plasma has developed rapidly, and has been widely used in plasma displays, chemical analysis devices, medicine, material processing and environmental governance and other fields. At present, there are various structures of microcavity plasma devices, among which the most common structure is metal-dielectric-metal structure. Many studies on discharge characteristics are based on this structure. According to di...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H05H1/24
CPCH05H1/2406Y02E30/10
Inventor 王耀功石益鑫麻晓琴
Owner XI AN JIAOTONG UNIV
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