Fabrication method of large-area highly ordered porous oxide films based on soft nanoimprinting

A porous oxide film, highly ordered technology, applied in the direction of anodic oxidation, surface reaction electrolytic coating, coating, etc., can solve the problems of long operation time, cumbersome operation, high cost, etc., and achieve the goal of convenient method and high tolerance Effect

Active Publication Date: 2019-03-12
SHANGHAI ADVANCED RES INST CHINESE ACADEMY OF SCI
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] In view of the shortcomings of the prior art described above, the purpose of the present invention is to provide a method for preparing a large-area highly ordered porous oxide film based on nano-soft imprinting, which is used to solve the problems of high cost, cumbersome operation, and problems in the prior art. Long time and other issues

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  • Fabrication method of large-area highly ordered porous oxide films based on soft nanoimprinting
  • Fabrication method of large-area highly ordered porous oxide films based on soft nanoimprinting
  • Fabrication method of large-area highly ordered porous oxide films based on soft nanoimprinting

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preparation example Construction

[0049] The invention provides a method for preparing a large-area highly ordered porous oxide film based on nano soft imprinting, the preparation method at least includes the following steps:

[0050] First, step 1 is performed, providing a master template with an ordered structure of micro-nano size, copying the ordered structure of micro-nano size onto a silica gel soft template, and obtaining a soft silica gel template with an ordered structure of micro-nano size.

[0051] The said master template has no special limitation on the material, it can be metals such as nickel, copper, chromium or alloys thereof, and it can also be an inorganic template such as silicon, glass, quartz, sapphire, titanium dioxide (TiO 2 ), iron oxide (Fe 2 o 3 ), indium oxide (In 2 o 3 ), zinc oxide (ZnO), tungsten oxide (WO 3 ), bismuth vanadate (BiVO 4 ) Silicon nitride (Si 3 N 4 ), boron nitride (BN), titanium nitride (TiN), silicon carbide (SiC), titanium carbide (TiC), zirconium carbide...

Embodiment 1

[0082] In this example, a large-size HOAAO based on nano-soft imprinting is prepared, and the preparation process is as follows:

[0083] 1. Coat the well-mixed PDMS precursor and curing agent (10:1) on the master template with micro-nano pillars, the thickness is about 0.2cm, remove air bubbles in vacuum, and then place at 60°C Cured in an oven for 3 hours, cooled to room temperature and uncovered to obtain a PDMS soft mold.

[0084] 2. Place the Al sheet in acetone, ethanol, and water for ultrasonic cleaning for 15 minutes. Using the Al sheet as the anode and the graphite sheet as the cathode, perform electrochemical polishing treatment in a mixed solution of chromic acid and ethanol (volume ratio 3:1) at 5°C, with a voltage of 10V and a treatment time of 8 minutes, to obtain a smooth and even surface of the Al sheet .

[0085] 3. Coating UV-curable glue on the Al sheet obtained in step 2 by means of spin coating at a speed of 3000 r / min for 50 s, and the thickness of the ...

Embodiment 2

[0091] In this example, a large-size inverted tapered HOAAO based on nano soft imprinting is prepared, and the preparation process is as follows:

[0092] 1. Coat the well-mixed PDMS precursor and curing agent (10:1) on the master template with micro-nano pillars, the thickness is about 0.2cm, remove air bubbles in a vacuum, and then place it in a certain 60 ℃ in an oven for 3 hours, and then peel off after cooling to room temperature to obtain a PDMS soft mold.

[0093] 2. Place the Al sheet in acetone, ethanol, and water for 15 minutes for ultrasonic cleaning. Using the Al sheet as the anode and the graphite sheet as the cathode, perform electrochemical polishing treatment in a mixed solution of chromic acid and ethanol (volume ratio 3:1) at 5°C, with a voltage of 10V and a treatment time of 8 minutes, to obtain a smooth and even surface of the Al sheet .

[0094] 3. Coating UV-curable glue on the Al obtained in step 2 by spin coating at a speed of 3000r / min for 50s, and t...

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Abstract

The invention provides a preparation method of large-area highly-ordered porous oxide films based on nano soft embossing. The preparation method at least comprises the following steps: firstly copying a micro-nano-sized ordered structure of a mother template to a silica gel soft template, simultaneously providing a metal substrate and pretreating the metal substrate; then coating the surface of the metal substrate with an ultraviolet curing adhesive, carrying out nano embossing treatment on the ultraviolet curing adhesive by using the silica gel soft template, removing the silica gel soft template, and forming the micro-nano-sized ordered structure on the ultraviolet curing adhesive; subsequently taking the ultraviolet curing adhesive as a mask, transferring the micro-nano-sized ordered structure to the metal substrate by using an etching process and removing the residual ultraviolet curing adhesive; and forming a porous oxide film on the surface of the metal substrate by using an anodic oxidation method. The preparation method can be used for preparing large-area oxide films such as HOAAO and HOATO and the like; the method is efficient and convenient and is low in cost.

Description

technical field [0001] The invention belongs to the technical field of micro-nano manufacturing, and relates to a method for preparing a porous oxide film, in particular to a method for preparing a large-area highly ordered porous oxide film based on nano soft imprinting. Background technique [0002] Porous anodic oxide films (such as aluminum oxide (Anodic Aluminum Oxide, AAO), titanium oxide (Anodic Titanium Oxide, ATO), etc.) can self-organize and grow into a nano-scale hexagonal close-packed pore structure. Regulation can controllably obtain pore sizes ranging from tens of nanometers to hundreds of nanometers or even micrometers. The anodic oxidation method has low cost and simple process, and has broad application prospects in the fields of electronics, optoelectronics, biomedicine, and electrochemistry (Li., et al., Chem. Mater. 2009, 21, 253; Li., et al., Adv . Mater. 2008, 20, 4575; Zhang., et al., ECS Solid State Letters 2013, 2, Q1). The AAO and ATO grown by sel...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C25D11/02
CPCC25D11/022
Inventor 李东栋许贞李温超张驰陈小源鲁林峰殷敏
Owner SHANGHAI ADVANCED RES INST CHINESE ACADEMY OF SCI
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