Quantum dot light-emitting diode doped with charge transport layer and preparation method
A technology of quantum dot luminescence and charge transport layer, applied in circuits, electrical components, electric solid devices, etc., can solve the problems of unbalanced carrier injection, increase Auger recombination, difficulty in hole injection, etc., to improve device performance , the effect of improving hole injection efficiency
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[0035] The preparation method of quantum dot light-emitting diode is as follows:
[0036] Step 101: Spin-coating the hole injection layer on the anode, annealing and forming;
[0037] Step 102: use the same solvent to disperse two hole transport materials, mix them according to different ratios, spin coat the mixed materials on the hole injection layer, and anneal and form them;
[0038] Step 103: Spin coating the quantum dot thin film on the hole transport layer, annealing and forming;
[0039] Step 104: using the same solvent to disperse the electron transport material and the polymer, doping according to different ratios, spin coating the electron transport layer on the quantum dot film, annealing and forming;
[0040] Step 105: Evaporating a cathode layer on the electron transport layer to obtain a quantum dot light-emitting diode.
[0041] The hole injection efficiency is improved by mixing two hole transport materials as the hole transport layer, and the electron injec...
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[0043] The anode layer is made of ITO
[0044] The material used for the hole injection layer is PEDOT:PSS. The materials used for the hole transport layer are CBP-V and TFB. The material used for the quantum dot film is ZnCdS / ZnS. Materials used for the electron transport layer are ZnO and polyvinylpyrrolidone. The material used for the cathode layer is Al.
[0045] The preparation method of quantum dot light-emitting diode is as follows:
[0046] Step 1: Spin-coat the hole injection layer PEDOT:PSS on the anode ITO, then anneal at 140°C for 15 minutes to form;
[0047] Step 2: Disperse CBP-V and TFB with toluene, mix it with CBP-V according to the ratio of 10%, 20%, 30%, and 40% of TFB, and spin-coat the mixed material on the hole injection layer. Annealed at 240°C for 30 minutes to form;
[0048] Step 3: spin-coat the quantum dot film on the hole transport layer in a glove box, and anneal at 100°C for 5 minutes to form;
[0049]Step 4: Use ethanol to disperse the ele...
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