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Nickel oxide electrochromic composite film and preparation method and application thereof

An electrochromic and composite film technology, applied in ion implantation plating, coating, instruments, etc., can solve the problems that it is difficult to exceed 150°C, PET is not suitable, and the temperature resistance of PET materials is not high, so as to suppress color attenuation , Provide stability, high charge capacity effect

Pending Publication Date: 2021-12-31
NINGBO INST OF MATERIALS TECH & ENG CHINESE ACADEMY OF SCI
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] Although the above-mentioned high-temperature post-treatment process helps to improve the performance of nickel oxide films on rigid substrates such as glass, it is not suitable for devices on flexible polymer substrates such as PET, because the temperature resistance of PET materials is not high, and it is difficult to exceed 150°C

Method used

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  • Nickel oxide electrochromic composite film and preparation method and application thereof
  • Nickel oxide electrochromic composite film and preparation method and application thereof
  • Nickel oxide electrochromic composite film and preparation method and application thereof

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preparation example Construction

[0044] Another aspect of the aspect of the present invention further provides a method for preparing the above-described electrochromic composite nickel oxide film, comprising:

[0045] Providing a substrate provided with a transparent conductive layer;

[0046] By magnetron sputtering, the target is a target of nickel oxide deposited on the surface of the transparent conductive layer forming the nickel oxide layer;

[0047] And, by magnetron sputtering, the target to zinc tin oxide as a target, an amorphous zinc tin oxide is deposited a buffer layer on a surface of the nickel oxide layer, thereby obtaining a nickel oxide electrochromic composite film.

[0048] In some more specific embodiments, the target comprising a pure nickel oxide or nickel oxide target co-doped nickel oxide target, and is not limited thereto.

[0049] Further, the co-doped nickel oxide target comprising Li, Si target co-doped nickel oxide or Sn, Ta, Nb and W, respectively, co-doped nickel oxide target, and ...

Embodiment 1

[0072] (1) Magnetron sputter deposition of Ni-oxide film

[0073] The Si and Li co-doped nickel oxide target placed in the magnetron sputtering device, depositing a thin film of nickel oxide nanorods on a conductive layer covering the ITO transparent PET substrate. During sputtering parameters are as follows: sputtering an intermediate frequency sputtering, the working gas is pure argon; the substrate temperature was 80 deg.] C; degree of vacuum of 5 × 10 -2 PA; sputtering gas pressure is 2.0 Pa; sputtering power density was 4.5W / cm 2 ; Thickness of the nickel oxide film is 140nm;

[0074] (2) by magnetron sputtering zinc tin oxide film deposited

[0075] The zinc tin oxide target placed magnetron sputtering apparatus, in step (1) zinc tin oxide film is deposited on the nickel oxide film is deposited, during sputtering main parameters are as follows: sputtering an intermediate frequency sputtering, working gas is pure argon; the substrate temperature was 80 deg.] C; degree of va...

Embodiment 2

[0089] (1) Magnetron sputter deposition of Ni-oxide film

[0090] Pure nickel oxide target placed in the magnetron sputtering device, depositing a thin film of nickel oxide nanorods on a conductive layer covering the ITO transparent PET substrate. During sputtering parameters are as follows: RF sputtering, sputtering or medium frequency sputtering, the working gas is pure argon; the substrate temperature was 25 deg.] C; degree of vacuum of 0.1 × 10 -2 PA; sputtering gas pressure is 0.4 Pa; sputtering power density was 2.0W / cm 2 ; Thickness of the nickel oxide film is 80nm;

[0091] (2) by magnetron sputtering zinc tin oxide film deposited

[0092] The zinc tin oxide target placed magnetron sputtering apparatus, in step (a) depositing a nickel oxide film is deposited on the zinc tin oxide film, sputtering the main parameters are as follows: RF sputtering, sputtering or IF sputtering, the working gas is pure argon; the substrate temperature was 25 deg.] C; degree of vacuum of 0.1 ...

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Abstract

The invention discloses a nickel oxide electrochromic composite film and a preparation method and application thereof. The nickel oxide electrochromic composite film comprises a nickel oxide layer and an amorphous zinc tin oxide buffer layer which are arranged in a laminated mode. The nickel oxide layer is provided with a crystal nano columnar structure, and the diameter of the crystal nano columnar structure is 10 to 100 nm. The charge capacity of the nickel oxide electrochromic composite film is 6.0 to 12.0 mC *cm<-2>. The nickel oxide electrochromic composite film prepared by the preparation method disclosed by the invention has better optical modulation amplitude, cycling stability and higher charge capacity, and has a good application prospect in a low-temperature coated flexible electrochromic device.

Description

Technical field [0001] The present invention pertains to electrochromic devices and application technology, in particular to a composite of nickel oxide electrochromic film and preparation method and application. Background technique [0002] In recent years, flexible electronic devices are increasingly attentions, such devices refers to the deformation (bending, folding, twisting, stretching or compressing) the electronic device still operating under conditions in the presence of a range. Among them, polyethylene terephthalate (PET) substrate is a flexible electrical device electrochromic smart window has been increasingly used in construction, automotive mirrors, multi-function display, the glasses, and other fields. The application of the high demands on the electrochromic device: good cycle stability, a large optical modulation amplitude, good neutral color, good mechanical properties, the response speed of the block, large area production. [0003] Conventional flexible elec...

Claims

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Application Information

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IPC IPC(8): G02F1/1524C23C14/35C23C14/08C23C14/02
CPCG02F1/1524C23C14/35C23C14/085C23C14/086C23C14/024
Inventor 杨晔楼其村冯旺旺宋伟杰
Owner NINGBO INST OF MATERIALS TECH & ENG CHINESE ACADEMY OF SCI
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