Method for forming organic nanowire array and organic nanowire array
A technology of organic nanowires and arrays, applied in nanotechnology, nanotechnology, nanotechnology for materials and surface science, etc., to achieve the effect of reducing difficulty and simple operation
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Embodiment 1
[0080] In this example, the 8-hydroxyquinoline aluminum nanowire array 1 is prepared, and the specific process is as follows:
[0081] (1) Take the single crystal M-face sapphire substrate as the raw material, put it into acetone, remove the oil on the surface through an ultrasonic cleaner, and then blow the surface with dry nitrogen; put the dried M-face sapphire substrate into ethanol , remove the residual acetone solvent, and blow the surface with nitrogen; put the dried M-plane sapphire substrate into deionized water, remove the organic solvent on the surface, dry the surface with nitrogen, and put the cleaned M-plane sapphire substrate into In the high-temperature box-type furnace, the temperature was raised to 1600°C at a speed of 5-15°C / min, and the temperature was kept at 1600°C for 10 hours, and then cooled to room temperature with the high-temperature box-type furnace. channel array;
[0082] (2) Adsorb the M-face sapphire substrate with parallel channel arrays in s...
Embodiment 2
[0088] In this example, the 8-hydroxyquinoline aluminum nanowire array 2 is prepared. The difference from Example 1 is that the hole diameter of the hollow mask is 300x300 μm 2 , the hole distance is 200μm. The specific process is:
[0089] (1) Take the single crystal M-face sapphire substrate as the raw material, put it into acetone, remove the oil on the surface through an ultrasonic cleaner, and then blow the surface with dry nitrogen; put the dried M-face sapphire substrate into ethanol , remove the residual acetone solvent, and blow the surface with nitrogen; put the dried M-plane sapphire substrate into deionized water, remove the organic solvent on the surface, dry the surface with nitrogen, and put the cleaned M-plane sapphire substrate into In the high-temperature box-type furnace, the temperature was raised to 1600°C at a speed of 5-15°C / min, and the temperature was kept at 1600°C for 10 hours, and then cooled to room temperature with the high-temperature box-type f...
Embodiment 3
[0096] In this example, the 8-hydroxyquinoline aluminum nanowire array 3 is prepared. The difference from Example 1 is that the hole diameter of the hollow mask is 200x200 μm 2 , the hole distance is 300μm. The specific process is:
[0097] (1) Take the single crystal M-face sapphire substrate as the raw material, put it into acetone, remove the oil on the surface through an ultrasonic cleaner, and then blow the surface with dry nitrogen; put the dried M-face sapphire substrate into ethanol , remove the residual acetone solvent, and blow the surface with nitrogen; put the dried M-plane sapphire substrate into deionized water, remove the organic solvent on the surface, dry the surface with nitrogen, and put the cleaned M-plane sapphire substrate into In the high-temperature box-type furnace, the temperature was raised to 1600°C at a speed of 5-15°C / min, and the temperature was kept at 1600°C for 10 hours, and then cooled to room temperature with the high-temperature box-type f...
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