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Yttrium-based thermal spray coating film using yttrium-based particle powder and method for preparing same

A thermal spraying and coating technology, applied in coating, melting spraying, spraying device, etc., can solve the problems of indistinguishable pollutants, arc danger and other problems, achieve excellent durability, improve yield, and reduce etching rate Effect

Active Publication Date: 2022-02-15
KOMICO
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0018] In addition, in Korean Publication Patent No. 10-2005-0013968 (February 5, 2005), a plasma-resistant member containing 100 to 1000 ppm silicon element in the yttrium oxide coating layer is disclosed, but the oxidized element containing silicon element The yttrium coating imparts electrical characteristics by including semiconductor components, and there is a risk of arcing. The basic color is black and cannot be distinguished from the contaminants in the semiconductor process. When cleaning the chamber, there is a high risk of adding unnecessary cleaning steps due to contamination.

Method used

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  • Yttrium-based thermal spray coating film using yttrium-based particle powder and method for preparing same
  • Yttrium-based thermal spray coating film using yttrium-based particle powder and method for preparing same
  • Yttrium-based thermal spray coating film using yttrium-based particle powder and method for preparing same

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preparation example Construction

[0042] The method for preparing the yttrium-based thermal spray film of the present invention is characterized in that the yttrium-based particle powder is subjected to atmospheric plasma thermal spraying to form a film on the base material, wherein the yttrium-based particle powder is formed in Y 2 o 3 , YOF, YF 3 , Y 4 Al 2 o 9 , Y 3 Al 5 o 12 and YAlO 3 One or more yttrium compound powders and silicon dioxide (SiO 2 ) powder mixture containing less than 10% by weight of Y-Si-O mesophase.

[0043] The atmospheric plasma thermal spraying method used as the thermal spraying process for preparing the thermal spraying film of the present invention is to concentrate the particles of the thermal spraying material into primary powders of several μm levels to form particle powders, and thus propose a method that will constitute this thermal spraying material The primary powder is made smaller, less than 1 μm, so as to increase the density of the thermal spray coating, but t...

preparation example 1～2

[0085] After mixing the binder with the yttrium oxide powder and the silica powder, a granulated powder was obtained by means of a spray dryer, and then the granulated powder was degreased and then sintered to obtain a sintered powder. The experimental conditions such as the size and mixing ratio of the yttrium oxide powder and silicon dioxide powder used in each preparation example are shown in Table 1 below, and the scanning electron microscope (SEM) photo of the prepared thermal spraying particle powder is shown in figure 1 .

[0086] Table 1

[0087]

Embodiment 1～8

[0089] Utilize the thermal spray material and plasma gun that preparation example 1 and 4 prepare, flow into argon gas and hydrogen gas as heat source gas, while moving thermal spray gun, generate plasma under the power of 40~50kW, utilize the generated plasma The body melts the raw material powder and forms a coating film on the base material. The thickness of the coating film was formed to have a thickness of 150˜200 μm, and the experimental conditions are shown in Table 2 below. In addition, the scanning electron microscope (SEM) photographs of the prepared thermal sprayed film sides are shown in figure 2 .

[0090] Table 2

[0091]

[0092]

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Abstract

The present invention relates to an yttrium-based thermal spray coating film using yttrium-based particle powder, and a method for preparing the same, and more particularly, to a method for preparing an yttrium-based thermal spray coating film having low porosity, high density, and excellent plasma resistance by plasma thermal spraying of yttrium-based particle powder, the yttrium-based particle powder being a mixture of one or more yttrium compound powder selected from among Y2O3, YOF, YF3, Y4Al2O9, Y3Al5O12 and YAlO3 and silica powder, and contains less than 10 wt% of a Y-Si-O intermediate phase.

Description

technical field [0001] The invention relates to a method for preparing a high-density thermal spraying film by using yttrium-based particle powder for thermal spraying containing silicon dioxide. Background technique [0002] In the semiconductor manufacturing process, the importance of the plasma dry etching process is becoming more and more important for the microfabrication required for the high integration of substrate circuits such as silicon wafers. [0003] In order to use it in such an environment, it has been proposed to use a material with excellent plasma resistance as a chamber member or to coat the surface of the member with a material with excellent plasma resistance to improve the life of the member. [0004] Among them, techniques for imparting new functionality by coating the surface of a substrate with various materials have been conventionally used in various fields. As one of such surface coating techniques, thermal spraying is known, for example, in whi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C4/134C23C4/11
CPCC23C4/134C23C4/11B05B7/226C23C4/04
Inventor 郑东勳方晟植郑在任金大成
Owner KOMICO