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Duplex stainless steel etching agent and etching method

A technology of duplex stainless steel and etchant, which is applied in the direction of measuring devices, instruments, and material analysis through optical means, etc., can solve the problems of high temperature time consumption, reduce work efficiency, safety protection, etc., and achieve obvious contrast, etch reproducibility and Good stability and little physical damage

Pending Publication Date: 2022-04-12
WANHUA CHEM GRP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The above-mentioned etching agents involve a large amount of volatile, oxidizing and highly acidic substances, and some etching methods require high temperature and take a long time. These factors reduce the work efficiency and also put forward high requirements for the safety protection of operators. Require

Method used

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  • Duplex stainless steel etching agent and etching method
  • Duplex stainless steel etching agent and etching method
  • Duplex stainless steel etching agent and etching method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0042] Configuration 20g etching agent, by weight percent is 30% methanesulfonic acid, 3% sorbic acid, 1.5% water-soluble chitosan, 1.5% sodium laurate, 7.5% ethanol and the deionized water of balance formulated.

[0043] The metallographic etchant prepared in this embodiment is used to display the metallographic structure of duplex stainless steel, and the specific method is as follows:

[0044] Step 1. Prepare the 2205 dual-phase steel sample, and inlay the sample according to the following method to facilitate the next step of grinding. Specimen inlay method: Put the 2205 dual-phase steel sample into the inlay groove of the metallographic inlay machine. When placing the sample, pay attention to the observation side of the sample facing down, add 10g of HM1 inlay material, then put it into the die and press the die Press it into the mosaic groove, cover and fix it, then start heating (heat to 135°C) and turn the first wheel to increase the pressure in the mosaic groove, and...

Embodiment 2

[0051] Configuration 20g etching agent, by weight percent is 40% methanesulfonic acid, 4% sorbic acid, 2% water-soluble chitosan, 2% sodium laurate, 10% ethanol and the deionized water of balance formulated.

[0052] The metallographic etchant prepared in this embodiment is used to display the metallographic structure of duplex stainless steel, and the specific method is as follows:

[0053] Step 1: Prepare the 2205 dual-phase steel sample, and inlay the sample according to the method in Example 1, so as to facilitate the next step of grinding.

[0054] Step 2. Put the inlaid sample on the metallographic pre-grinder, and grind it from coarse grinding to fine grinding through 400# water-based sandpaper, 600# water-based sandpaper, 1200# water-based sandpaper, and 2000# water-based sandpaper respectively. 500r / min; during the grinding process, continuously add water to cool, and after 10 minutes, when the scratches are all in the same direction, one grinding is completed, and t...

Embodiment 3

[0060] Configuration 20g etching agent, by weight percentage is 20% methanesulfonic acid, 2% sorbic acid, 1% water-soluble chitosan, 1% sodium laurate, 5% ethanol and the deionized water of remainder formulated. .

[0061] The metallographic etchant prepared in this embodiment is used to display the metallographic structure of duplex stainless steel, and the specific method is as follows:

[0062] Step 1: Prepare the 2205 dual-phase steel sample, and inlay the sample according to the method in Example 1, so as to facilitate the next step of grinding.

[0063] Step 2. Put the inlaid sample on the metallographic pre-grinder, and grind it from coarse grinding to fine grinding through 400# water-based sandpaper, 600# water-based sandpaper, 1200# water-based sandpaper, and 2000# water-based sandpaper respectively. 500r / min; during the grinding process, continuously add water to cool, and after 10 minutes, when the scratches are all in the same direction, one grinding is completed...

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PUM

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Abstract

The invention provides a duplex stainless steel etching agent and an etching method. The duplex stainless steel etching agent is prepared from methanesulfonic acid, sorbic acid, water-soluble chitosan, sodium laurate, ethanol and deionized water. According to the invention, organic acids such as methanesulfonic acid, sorbic acid and the like are supplemented with a proper amount of additives to replace hydrochloric acid, nitric acid and the like in a traditional etching agent formula, so that a good metallographic structure display effect can be achieved, the color contrast of ferrite and austenite is obvious, and the etching agent is simple in preparation process, easy to operate, environment-friendly and low in toxicity.

Description

technical field [0001] The invention relates to an etchant and an etching method for duplex stainless steel, belonging to the technical field of metallographic corrosion. Background technique [0002] In the prior art, chemical methods are usually used to etch the duplex stainless steel to make it show a two-phase structure of γ phase and α phase. Zhang Hongxia etc. have introduced the room temperature chemical etching agent of ferric chloride hydrochloric acid aqueous solution, aqua regia glycerin solution and caustic red blood salt solution (KOH+K 3 Fe(CN) 6 +H 2 O) thermochemical etchant and electrolytic etchant oxalic acid (commonly used chemical etchant for duplex stainless steel materials, "Thermal Processing Technology", 2009, volume 38, the 16th issue), these methods can achieve optical The purpose of distinguishing ferrite phase and austenite phase under microscope. Invention patent CN 108426883B discloses an etchant for duplex stainless steel, using sulfuric ac...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N1/32C23F1/28G01N21/84
Inventor 李文廷李云钊王龙山刘洋洋鲍恩成张宏科华卫琦
Owner WANHUA CHEM GRP CO LTD
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