Method for producing hydrofluoroolefin
A technology of hydrofluoroolefins and manufacturing methods, which is applied in the field of hydrofluoroolefins manufacturing, can solve the problems of low global warming coefficient and easy decomposition by ultraviolet rays, and achieve the effect of excellent selectivity
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Embodiment 1
[0175] [Pd 3 Preparation of Bi-supported silica 1]
[0176] Preparation of Pd by co-infiltration method 3 Bi supported silica 1. A specific preparation method will be described. In silica gel (Fuji Silysia Chemical Ltd., CARiACT G-6) as a carrier, with respect to 100 parts by mass of Pd 3 Nitric acid solutions of palladium nitrate and bismuth nitrate pentahydrate containing palladium and bismuth at an atomic ratio of 3 / 1 were added to Bi-supported silica 1 and the supported amount of palladium was 3 parts by mass, and stirred for 5 minutes to prepare a silica gel dispersion. After stirring, the silica gel dispersion was allowed to stand for 24 hours. Afterwards, dry at 110 °C, and then, under atmospheric pressure of H 2 The reduction treatment was performed by maintaining at 800° C. for 1 hour under air flow. Immediately after the reduction, the flow gas was switched to Ar gas, and naturally cooled to room temperature to obtain Pd 3 Bi supported silica 1(Pd 3 Bi / SiO 2...
Embodiment 2
[0181] [Pd 3 Preparation of In supported silica]
[0182] Preparation of Pd by successive impregnation method 3 In supported silica. A specific preparation method will be described. To the palladium-supported silica prepared by the above-mentioned method, an aqueous solution in which indium nitrate n-hydrate was dissolved was added in such a manner that the loading amount of palladium and indium became 3 / 1 in terms of atomic ratio, and stirred for 5 minutes to prepare palladium-supported silica. Silica dispersion. After stirring, the palladium-supported silica dispersion was left to stand for 24 hours. Afterwards, dry at 110 °C, and then, under atmospheric pressure of H 2 The reduction treatment was performed by maintaining at 800° C. for 1 hour under gas flow. Immediately after the reduction, the flow gas was switched to Ar gas, and naturally cooled to room temperature to obtain Pd 3 In supported silica (Pd 3 In / SiO 2 ).
Embodiment 3
[0184] [Pd 3 Preparation of Sn-loaded silica]
[0185] Preparation of Pd by successive impregnation method 3 Sn supported silica. A specific preparation method will be described. To the palladium-supported silica prepared by the above method, an ethanol solution in which tin chloride dihydrate was dissolved was added so that the supported amount of palladium and tin became 3 / 1 in atomic ratio, and stirred for 5 minutes to prepare palladium Loaded silica dispersion. After stirring, the palladium-supported silica dispersion was left to stand for 24 hours. Afterwards, dry at 110 °C, and then, under atmospheric pressure of H 2 The reduction treatment was performed by maintaining at 800° C. for 1 hour under gas flow. Immediately after the reduction, the flow gas was switched to Ar gas, and naturally cooled to room temperature to obtain Pd 3 Sn supported silica (Pd 3 Sn / SiO 2 ).
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