Ultraviolet all-dielectric super lens group

Abstract

The invention discloses an ultraviolet all-dielectric super lens, which comprises a transparent substrate and a sub-wavelength array structure, the sub-wavelength array structure is connected with the transparent substrate; the sub-wavelength array structure is formed by a plurality of unit structure arrays; the length and width of the unit structure are smaller than the working wavelength. The invention relates to an ultraviolet all-dielectric super lens group, which comprises two ultraviolet all-dielectric super lenses, namely a first all-dielectric super lens and a second all-dielectric super lens, the diameter ratio of the first all-dielectric super lens to the second all-dielectric super lens is designed to be 4: 1; the focal points of the first all-dielectric super lens and the second all-dielectric super lens coincide; light rays sequentially pass through the first all-dielectric super lens and the second all-dielectric super lens and then are emitted in parallel; according to the invention, an ultraviolet band single-wavelength super-surface lens is realized, the formed ultraviolet all-dielectric super-lens group has a beam shrinking function, the number of lenses of an ultraviolet system is reduced, the transmittance is high, the energy loss is small, and the processing technology is relatively simple.

Description

technical field [0001] The invention relates to the field of ultraviolet imaging technology, in particular to an ultraviolet all-dielectric superlens group. Background technique [0002] Metalenses are a hot research direction of micro-nanostructured metasurfaces. Metalenses use sub-wavelength micro-nano structures to regulate the wavefront of light. Based on their strong ability to manipulate light waves, metalenses have the advantages of ultra-light, ultra-thin, and easy integration. Ultra-miniature optoelectronic devices open a new road. In recent years, research on metalens in the visible and near-infrared bands has developed well, and single-wavelength, multi-wavelength, and broadband achromatic metalens in the visible band have been realized. However, there is still little research on metalens in the ultraviolet range. [0003] The ultraviolet lens group is the core component of the lithography machine. It requires diffraction-limited imaging quality, high resolutio...

AI Technical Summary

Problems solved by technology

The projection objective lens group used in lithography machines often requires complex lens combinations, and its system is extremely complex. The lens group needs to reduce the chip layout to the field of view at a ratio of 4:1. At the same time, it requires a large numerical aperture NA and low wave aberration. Small, small distortion, the current domestically designed lens group is composed of 27 chips and 11 movable lenses, and the processing accuracy is at the sub-nanometer level

This limits the size of the lithography machine, and the complex mirror group structure also puts forward higher requirements for lens assembly

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