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High-transmittance shadow-eliminating conductive glass and manufacturing method thereof

A technology of conductive glass and glass substrate, applied in the direction of coating, etc., can solve the problems of reduced reflectivity, limited effect of anti-reflection, single material, etc., and achieve the effect of smooth change of refractive index, significant effect of shadow elimination, and enhanced transmittance

Pending Publication Date: 2022-05-06
凯盛信息显示材料(洛阳)有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] For example, in the prior art, the conductive glass produced in the patent No. CN104834420A "a conductive glass for capacitive touch screen and its preparation process" has a transmittance of ≥ 88.5%, and its reflectivity is also reduced. The capacitive touch screen of conductive glass improves the shadow removal effect while being ultra-thin. However, in this patent, the shadow removal effect is only performed through the shadow removal layers arranged on both sides of the glass substrate, and the shadow removal effect still needs to be further improved.
As another example, the patent No. is CN106587655A in the "disappearing anti-reflection conductive glass" by setting the stacked TiO 2 layer, SiO 2 layer and ITO layer, using TiO with different refractive index 2 film and SiO 2 The film layer plays the role of image elimination, anti-reflection and anti-reflection. It can be seen from this that the material used in this patent is single, and there are many film layers, and the thickness of the film layer is thicker. The effect is limited, and it is easy to cause waste of resources, only relying on TiO 2 film and SiO 2 The refractive index of the film layer is different for shadow elimination, and its shadow elimination effect needs to be further optimized

Method used

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  • High-transmittance shadow-eliminating conductive glass and manufacturing method thereof

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specific Embodiment 1

[0035] figure 1It is a structural schematic diagram of a specific embodiment 1 of a high-transmission and shadow-elimination conductive glass of the present invention, from which it can be seen that the present invention provides a high-transmission and shadow-elimination conductive glass, comprising a glass substrate 1 with a thickness of 80nm, on the glass substrate One side of the 1 is etched with several nano-scale anti-reflection holes 5 with tapered structures, the aperture of the nano-scale anti-reflection holes 5 is 3nm, and the porosity is 20%; the glass substrate 1 is etched with nano-scale anti-reflection holes 5 One side is provided with a thickness compensation layer 2 with a thickness of 10 nm. The material of the thickness compensation layer 2 is silicon dioxide, which can not only protect the nanoscale anti-reflection holes 5 to a certain extent, but also protect the upper functional layer, killing two birds with one stone. A transition film layer 3 with a thic...

specific Embodiment 2

[0047] figure 2 It is a structural schematic diagram of a specific embodiment 2 of a high-transmission and shadow-elimination conductive glass of the present invention, from which it can be seen that the present invention provides a high-transmission and shadow-elimination conductive glass, comprising a glass substrate 1 with a thickness of 150nm, on which the glass substrate The upper and lower sides of 1 are etched with several nano-scale anti-reflection holes 5 with a tapered structure, the diameter of the nano-scale anti-reflection holes 5 is 10 nm, and the porosity is 30%; the glass substrate 1 is etched with nano-scale anti-reflection holes 5 A thickness compensation layer 2 with a thickness of 30nm is provided on one side, and the material of the thickness compensation layer 2 is silicon dioxide, which can not only protect the nanoscale anti-reflection holes 5 to a certain degree, but also protect the upper functional layer. Killing two birds with one stone, the thickn...

specific Embodiment 3

[0059] The present invention provides a high-transmission and shadow-eliminating conductive glass, which comprises a glass substrate 1 with a thickness of 100nm. On one side of the glass substrate 1, several nano-scale anti-reflection holes 5 with tapered structures are etched. The nano-scale anti-reflection holes 5 The pore diameter is 8nm, and the porosity is 25%. A 20nm-thick thickness compensation layer 2 is provided on the side of the glass substrate 1 etched with nanoscale anti-reflection holes 5. The material of the thickness compensation layer 2 is silicon dioxide, both The nano-scale anti-reflection hole 5 can be protected to a certain extent, and the upper functional layer can be protected, killing two birds with one stone. The thickness compensation layer 2 is provided with a transition film layer 3 with a thickness of 130 nm, and the transition film layer 3 is provided with a 60 nm film. thick indium tin oxide film layer 4, and electrode patterns are etched on the i...

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Abstract

The invention relates to the technical field of electronic display device glass panels, in particular to high-transmittance shadow-eliminating conductive glass which comprises a glass substrate, and nanoscale antireflection holes are etched in at least one face of the glass substrate. A thickness compensation layer is arranged on the surface, etched with the nanoscale antireflection holes, of the glass substrate, a transition film layer and an indium tin oxide film layer are sequentially stacked on the thickness compensation layer, and an electrode pattern is etched on the indium tin oxide film layer; wherein the transition film layer comprises a first interference layer, an ultraviolet absorption layer and a second interference layer which are stacked in sequence, the first interference layer and the second interference layer are made of niobium pentoxide, and the ultraviolet absorption layer is made of titanium dioxide; the invention also provides a preparation method of the high-transmittance shadow-eliminating conductive glass. The shadow eliminating effect is remarkable, the transmissivity of the conductive glass is enhanced, the reflectivity of the conductive glass is reduced, and the practicability is high.

Description

technical field [0001] The invention relates to the technical field of glass panels of electronic display devices, in particular to high-transmission and shadow-eliminating conductive glass and a manufacturing method thereof. Background technique [0002] Capacitive touch screen is a development trend. Its preparation method is mainly to coat a layer of conductive film (that is, indium tin oxide, referred to as: ITO) on the surface of ordinary glass to make it conductive. This is conductive glass. Indium tin oxide transparent conductive film glass is a high-tech product obtained by sputtering indium tin oxide conductive film coating on ultra-thin glass and high-temperature annealing treatment by using planar magnetron technology. However, the current conductive glass either does not meet the requirements of resistance, or the uniformity of resistance is not good, or the light transmittance is too low, etc., and it does not have the function of shadow elimination, so it canno...

Claims

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Application Information

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IPC IPC(8): C03C15/00C03C17/34
CPCC03C15/00C03C17/3417C03C2218/112C03C2218/156
Inventor 倪植森李结松黄茜茜许红灯朱汪根吕明泽钟汝梅
Owner 凯盛信息显示材料(洛阳)有限公司
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