Integrated circuit layout method and layout device

An integrated circuit and layout technology, applied in the direction of circuits, CAD circuit design, electrical components, etc., can solve the problems of low layout efficiency of integrated circuits, improve layout accuracy, improve lithography quality, and improve layout efficiency Effect

Pending Publication Date: 2022-05-10
CHANGXIN MEMORY TECH INC
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  • Abstract
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  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The invention provides a layout method and a layout device of an integrated circuit, which are used to solve the problem of low layout efficiency of the existing integrated circuit, to improve the layout accuracy, improve the quality of photolithography, shorten the development cycle of the integrated circuit, and improve Yield of semiconductor products

Method used

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  • Integrated circuit layout method and layout device
  • Integrated circuit layout method and layout device

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Embodiment Construction

[0062] The specific embodiments of the layout method and the layout device of the integrated circuit provided by the present invention will be described in detail below with reference to the accompanying drawings.

[0063] This specific embodiment provides a layout method of an integrated circuit, with the attached figure 1 It is a flow chart of the layout method of the integrated circuit in the specific embodiment of the present invention, with the attached Figures 2A-2D It is a schematic diagram of detecting a layout in the specific embodiment of the present invention. like figure 1 , Figures 2A-2D As shown, the layout method of an integrated circuit provided by this specific embodiment includes the following steps:

[0064] Step S11, providing a layout, the layout includes a first component area 21 and a second component area 22, and there is an interval area 23 between the first component area 21 and the second component area 22, such as Figure 2A shown.

[0065] S...

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Abstract

The invention relates to a layout method and a layout device of an integrated circuit. The layout method of the integrated circuit comprises the following steps that a layout is provided, the layout comprises a first element area and a second element area, and a spacer area is arranged between the first element area and the second element area; whether the width of the interval area is smaller than a preset width or not is detected, if yes, at least one of the first element area, the second element area and the interval area is marked, the preset width refers to the minimum width meeting the requirement, and the requirement is that the interval area is filled with at least one virtual pattern. According to the method, the element area with poor placement position in the layout can be quickly and accurately positioned, the layout efficiency of the integrated circuit is improved, the layout accuracy is improved, and a foundation is laid for improving the photoetching quality, shortening the development period of the integrated circuit, improving the yield of semiconductor products and the like.

Description

technical field [0001] The invention relates to the field of integrated circuit manufacturing, in particular to a layout method and a layout device for an integrated circuit. Background technique [0002] A dynamic random access memory (Dynamic Random Access Memory, DRAM) is a semiconductor device commonly used in electronic equipment such as computers, and it is composed of a plurality of repeated storage units, and each storage unit usually includes a transistor and a capacitor. The gate of the transistor is electrically connected to the word line, the source is electrically connected to the bit line, and the drain is electrically connected to the capacitor. The word line voltage on the word line can control the opening and closing of the transistor, so that the stored data can be read through the bit line. Data information in the capacitor, or write data information into the capacitor. [0003] With the continuous shrinking of DRAM process nodes, the requirements for lay...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L27/02H01L27/108
CPCH01L27/0207H10B12/02H01L27/02G06F30/30H10B12/00
Inventor 陈川江赵康白黎唐力徐静
Owner CHANGXIN MEMORY TECH INC
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