Amorphous and nanocrystalline alloy with net structure and preparation method and application of amorphous and nanocrystalline alloy
An amorphous nanocrystalline and network structure technology, applied in the field of alloys, can solve the problems of low crystal/amorphous ratio, increase of saturation magnetic induction intensity and decrease of coercive force, and difficulty in controlling the size of nanocrystals. Effects of saturation magnetic induction intensity and permeability, excellent mechanical properties, and excellent soft magnetic properties
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Embodiment 1
[0032] The amorphous nanocrystalline (Fe 0.8 Co 0.2 ) 84 B 14 Si 1 Cu 1 The preparation method of soft magnetic alloy comprises the following steps:
[0033] Step 1: Select (Fe) prepared by the melt rapid quenching method 0.8 Co 0.2 ) 84 B 14 Si 1 Cu 1 Amorphous alloy, its structure is characterized by X-ray diffractometer and transmission electron microscope, and its XRD pattern structure is as follows figure 1 As shown, its TEM photo is as figure 2 It can be seen that the selected (Fe 0.8 Co 0.2 ) 84 B 14 Si 1 Cu 1 The amorphous alloy strip has an amorphous structure;
[0034] Step 2: Fix the above amorphous alloy strip on the Cu support with AB glue, put it into the chamber of the ion thinning apparatus, and vacuumize;
[0035] Step 3: Adjust the left and right ion gun angles to 8° and -8° respectively, set the applied voltage to 8keV, and set the ion gun thinning time to 30min.
[0036] Repeat the process of step 3 above for 4 times, with an interval o...
Embodiment 2
[0043] The amorphous nanocrystalline (Fe 0.8 Co 0.2 ) 84 B 14 Si 1 Cu 1 Nb 0.5 The preparation method of soft magnetic alloy comprises the following steps:
[0044] Step 1: Select (Fe) prepared by the melt rapid quenching method 0.8 Co 0.2 ) 84 B 14 Si 1 Cu 1 Nb 0.5 Amorphous alloy, the selected strip was confirmed to be amorphous structure by X-ray diffractometer and transmission electron microscope.
[0045] Step 2: Fix the above-mentioned amorphous ribbon on the Cu support with AB glue, put it into the chamber of the ion thinning apparatus, and vacuumize;
[0046] Step 3: Adjust the left and right ion gun angles to 10° and -10° respectively, set the applied voltage to 8keV, and set the ion gun thinning time to 30min.
[0047] Repeat the process of step 3 above 3 times, with 5min intervals each time, until a light-transmitting hole appears in the middle.
[0048] Step 4: Adjust the left and right ion gun angles to 5° and -5° respectively, set the applied volta...
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