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Method for evaporating thick chromium metal layer by using single crucible

A chromium metal and crucible technology, applied in the field of semiconductor processing, can solve the problems of insufficient corrosion resistance of thin films, high preparation cost, expensive sputtering equipment, etc., and achieve the effect of easy to understand production principle and simple operation method.

Active Publication Date: 2022-06-24
SHANDONG INSPUR HUAGUANG OPTOELECTRONICS
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  • Abstract
  • Description
  • Claims
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Problems solved by technology

[0005] Chinese patent document CN110499494A discloses a Cr / Al monolayer film based on Zr and its preparation method, which uses a magnetron sputtering coating method to deposit a Cr / Al film with a thickness greater than 10 μm on the Zr surface, which solves the problem The surface roughness of the coating prepared by multi-arc ion plating and the insufficient corrosion resistance of the film prepared by magnetron sputtering
This invention uses the sputtering method to realize the production of a thick Cr layer, but the magnetron sputtering method is used, the sputtering equipment is expensive, and the preparation cost is relatively high

Method used

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  • Method for evaporating thick chromium metal layer by using single crucible
  • Method for evaporating thick chromium metal layer by using single crucible
  • Method for evaporating thick chromium metal layer by using single crucible

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Embodiment

[0042] A method of evaporating thick chromium metal layers using a single crucible to make 7*8mil 2 Taking the size electrode as an example, the above-mentioned electron beam evaporation table is used, and the specific steps are as follows:

[0043] (1) Fill the crucible 007 with a capacity of 40cc with metallic chromium particles (the purity of metallic chromium is 99.99%, and the particle size is 3-5 mm) as the evaporation source 001. The upper surface of the evaporation source 001 is flush with the top of the crucible 007 ( be flush with the bottom end of the crucible side wall 005); put the wafer to be evaporated into the evaporation table cavity 003, and then evacuate to make the vacuum degree in the evaporation table cavity 003 reach more than 3.0E-6 Torr;

[0044] (2) the electron gun scanning is adjusted to the maximum state that the electron beam spot area is the largest, and the electron beam spot shape is adjusted to an ellipse, and the short diameter of the ellipti...

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Abstract

The invention provides a method for evaporating a thick chromium metal layer by using a single crucible. A single crucible is used, a warping layer formed by evaporation each time is scattered into particles again through adjustment of electron beams and the position of the crucible, then evaporation continues to be carried out, and therefore evaporation of the metal Cr thick film layer is completed. According to the method, the defect that multi-crucible evaporation is needed for preparing the thick metal Cr layer is overcome, the surface morphology of the metal source in the evaporation process is adjusted, and preparation of the thick metal Cr layer can be effectively achieved through a simple method, low cost and a single crucible.

Description

technical field [0001] The invention relates to a method for evaporating a thick chromium metal layer by using a single crucible, and belongs to the technical field of semiconductor processing. Background technique [0002] LED (Light Emitting Diode), namely light-emitting diode, is a solid-state semiconductor light-emitting device, which can directly convert electrical energy into light energy. LED is called the fourth-generation light source, which has the characteristics of energy saving, environmental protection, safety, long life, low power consumption, low heat, high brightness, waterproof, miniature, shockproof, easy dimming, beam concentration, and easy maintenance, etc. It can be widely used in Various indications, displays, decorations, backlights, general lighting and other fields. With the continuous development of the industry, breakthroughs in technology, and the vigorous promotion of applications, the luminous efficiency of LEDs is also continuously improving...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/30C23C14/18
CPCC23C14/30C23C14/18
Inventor 徐晓强程昌辉吴向龙闫宝华王成新
Owner SHANDONG INSPUR HUAGUANG OPTOELECTRONICS
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