Field effect transistor device based on two-dimensional interlayer slippage ferroelectric semiconductor and preparation method thereof
A field effect transistor, interlayer slip technology, applied in semiconductor/solid state device manufacturing, semiconductor devices, electrical components, etc., can solve the problems of no longer providing performance improvement, increasing manufacturing costs, etc., to achieve voltage reduction, low power consumption Effects of storage, shrinking device size
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[0022] A field effect transistor device based on a two-dimensional interlayer slip ferroelectric semiconductor and a preparation method thereof of the present invention will be further described with reference to the accompanying drawings.
[0023] A field effect transistor device based on a two-dimensional interlayer slip ferroelectric semiconductor of the present invention includes a supporting substrate 1, a back gate electrode 2, a ferroelectric dielectric layer 3, an insulating dielectric layer 4 and a source that are sequentially stacked from bottom to top Drain electrode, the source-drain electrode includes a source electrode 6 and a drain electrode 7, a conductive channel 5 is provided between the source electrode 6 and the drain electrode 7, and the conductive channel 5 is a graphene material, The ferroelectric dielectric layer 3 is a layered two-dimensional interlayer slip ferroelectric semiconductor material GaSe, the insulating dielectric layer 4 is a h-BN material,...
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