Method for realizing polymorphic storage based on CrOCl material
A multi-state storage and graphite material technology, applied in the field of spintronics, can solve difficult problems and achieve the effect of low cleavage energy and good air stability
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[0023] Below in conjunction with the accompanying drawings, the present invention will be further described through specific embodiments.
[0024] In this example, a 10nm CrOCl tunneling device is used to prove that the memory device has the advantages of stability, high efficiency, and continuous control of the resistance state:
[0025] (1) Preparation of the device. The two-dimensional layered hBN material with a thickness of 10-50 nm, a graphite material with a thickness of 1-3 nm, and a CrOCl material with a thickness of less than 20 nm were obtained by mechanical exfoliation method. on Si-SiO 2 On the substrate, the tunneling junction device is prepared through the steps of electron beam exposure, reactive ion etching, electron beam evaporation and the like. Optical photos of CrOCl tunneling junction devices such as figure 1 shown.
[0026] (2) Measure the change of the tunneling current with the magnetic field, such as figure 2 , the magnetic phase transition occu...
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