Low-hydroxyl opaque quartz glass and manufacturing method thereof

A technology of transparent quartz and manufacturing methods, applied in glass manufacturing equipment, manufacturing tools, glass molding, etc., can solve the problems of lack of low-hydroxyl opaque quartz glass materials, etc., and achieve low metal impurity content and good micropore uniformity.

Active Publication Date: 2022-07-15
SHANGHAI USTRON QUARTZ GLASS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, there is still a lack of a low-hydroxyl, high-purity opaque quartz glass material on the market.

Method used

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  • Low-hydroxyl opaque quartz glass and manufacturing method thereof
  • Low-hydroxyl opaque quartz glass and manufacturing method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0075] 1) Prepare a green body.

[0076] Choose SiCl 4 is the silicon source, H 2 for heat source.

[0077] The SiCl 4 The liquid is passed into the evaporative gasification device, which does not belong to the content of the present invention and is purchased from outside. Set the gasification temperature to 95°C, use a constant temperature pipeline to connect the gasification device to the reactor, and set the pipeline temperature to 95°C to avoid SiCl 4 liquefaction. SiCl 4 The inflow is accurately measured by a mass flow meter to control the reaction process and improve the utilization of Si source.

[0078] Hydrogen and oxygen were fed into the reactor, and a mass flow meter was used to accurately measure the incoming amount.

[0079] The above three gases react chemically in the reactor to generate SiO 2 , the reaction principle is as follows:

[0080] SiCl 4 +2H 2 +O 2 =SiO 2 +4HCl

[0081] In the present embodiment, the reaction volume ratios of the three...

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Abstract

The invention belongs to the technical field of quartz glass manufacturing, and particularly relates to low-hydroxyl opaque quartz glass and a manufacturing method thereof. The manufacturing method of the low-hydroxyl opaque quartz glass comprises the following steps: S1, carrying out vapor deposition reaction on a Si source, fuel gas and oxygen in a reactor to obtain SiO2 powder, depositing the SiO2 powder on a target carrier, and removing the target carrier to obtain a SiO2 blank; s2, the SiO2 green body is placed in a vacuum furnace to be subjected to dehydroxylation treatment; and S3, keeping the SiO2 green body in a vacuum environment in a vacuum furnace, and sintering to obtain the low-hydroxyl opaque quartz glass. The density distribution of the opaque quartz glass obtained by the method is between 2.10 g / min and 2.15 g / min, the micropore uniformity is good, the hydroxyl content is less than 10ppm, the metal impurity content is less than 50ppb, and the purity reaches the same level of synthetic quartz glass.

Description

technical field [0001] The invention belongs to the technical field of quartz glass manufacturing, in particular to a low-hydroxyl opaque quartz glass and a manufacturing method thereof. Background technique [0002] Quartz glass materials and products are widely used in semiconductor chip manufacturing processes, and are the carrier devices and cavity consumables required for semiconductor etching, diffusion, oxidation and other processes. In semiconductor quartz devices, opaque quartz is often used for heat preservation and heat insulation. This kind of material has excellent infrared blocking properties. Generally, in the infrared band of 1500nm to 2500nm and 3mm thickness, the transmittance is less than 1%, or even higher. Low. Opaque quartz materials are widely used in core key parts such as semiconductor epitaxy equipment and oxidation equipment. [0003] The blocking effect of opaque quartz on infrared radiation is formed by the internal micro-bubble, and the diamet...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03B19/14C03B20/00
CPCC03B20/00C03B19/1407C03B19/1453
Inventor 胡付俭周厚盟梁伟兴
Owner SHANGHAI USTRON QUARTZ GLASS CO LTD
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