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Exposure controlling light mask and production method thereof

A technology of exposure control and photomask, applied in radiation control devices, optics, optical components, etc., can solve the problem that it is difficult to control the fine concave-convex part of the curved surface shape

Inactive Publication Date: 2006-03-01
西 孝
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the shape of the lens that can be formed is limited by the heating temperature and heating time, so it is difficult to control the fine concave-convex part of the curved surface shape

Method used

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  • Exposure controlling light mask and production method thereof
  • Exposure controlling light mask and production method thereof
  • Exposure controlling light mask and production method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0049] Example 1 involves figure 1 The exposure control photomask (A) and its method of formation are shown. image 3 (1) to 3(5) schematically show the process of forming the exposure control photomask (A) of Example 1.

[0050] In the mask substrate 3 ( image 3 (1)) Deposit a layer of light-blocking film 2 ( image 3 (2)), and then deposit a layer of resist layer 6 on it ( image 3 (3)). The irradiation intensity is changed according to the position relative to the resist layer 6, or the number of times of irradiation and the irradiation time are changed while keeping the irradiation intensity constant. Therefore, by performing irradiation by controlling the amount of irradiation, and then performing development, the resist layer 6 is formed with curved-surface-shaped concavo-convex portions ( image 3 (4)). Next, the etch rates of the resist layer 6 and the base material (light-blocking film) above are set to be the same, and then etch back is performed, so that the...

Embodiment 2

[0053] In Example 2 it will be explained figure 2 The exposure control photomask (B) and its method of formation are shown.

[0054] On the mask substrate 3 is deposited a transparent material 5 such as an oxide film. Next, a layer of resist is deposited. Change the irradiation intensity according to the position of the resist layer, or change the number of irradiation and the irradiation time while keeping the irradiation intensity constant. Therefore, by controlling the irradiation amount to perform irradiation and then perform development, the thickness of the resist layer is made different, thereby forming curved-surface-shaped concave-convex portions. The etch rate of the resist layer and the base insulating material are set to be the same, and the shape of the resist layer is transferred to the base insulating material 5 after performing etch back. After depositing the light-blocking film 2 on the above-mentioned insulating material, the entire surface of the light-b...

specific example 1

[0067] Figure 7 (1) to 7(3) are sectional views showing one example of the method of forming a microlens of the present invention in order of process.

[0068] A layer of lens material film 13 is deposited on the leveling film 12 formed on the passivation film 11 of the solid-state image sensing element. Then deposit a layer of resist film 14 on the whole surface ( Figure 7 (1)). By exposing and developing the resist film 14 by an exposure method with a controlled exposure amount, the resist film 14 is formed into a pattern that makes each pixel independent, and then the shape of each pixel becomes a convex lens shape ( Figure 7 (2)). Thereafter, the resist film 14 and the lens material film 13 are etched back with a mixed gas of oxygen and a gas having deposition characteristics, thereby transferring the above-mentioned convex lens shape to the lens material film 13 .

[0069] Reference numerals 17, 18, 19 and 20 denote a semiconductor substrate, a vertical transfer el...

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Abstract

The present invention relates to an exposure controlling photomask used to form a three-dimensional face structure in a resist pattern and having a light interrupting film able to be continuously controlled in transmitted light amount from 100% to 0%, and a production method thereof. A light interrupting film 2 is deposited on a substrate 3 , and a photosensitive material 6 is coated on this light interrupting film 2 . Next, irradiation is performed by changing the irradiating amount of an electron beam every place of the photosensitive material 6 using an electron beam exposure technique. Next, development is performed and the photosensitive material is formed in the three-dimensional face structure. Next, in an etching process, the three-dimensional face structure is transferred to the light interrupting film 2 by etching-back the photosensitive material 6 and the light interrupting film 2 as a foundation.

Description

technical field [0001] The present invention relates to an exposure control photomask for manufacturing three-dimensional surface structures such as microlenses, microstructures, microgears, optical integrated circuits, reflective liquid crystal displays, and microcoils and its forming method. Background technique [0002] Among techniques for forming a three-dimensional surface structure such as a microcoil, there is a photolithography technique disclosed in, for example, Japanese Patent No. 3132727. This lithography technique employs an exposure control photomask that continuously controls the amount of transmitted light. Among the exposure control photomasks are the following photomasks. [0003] The first exposure control photomasks are described in Japanese Patent Publication No. 27636 / 1994 and No. 237625 / 1999. Figure 13 The mask disclosed in the prior art shown is a mask that controls the amount of transmitted light by laminating light-blockin...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/14G02B3/00B81C1/00G03F1/54G03F1/70G03F1/80G03F7/00H01L27/146H01L31/0232
CPCH01L31/0232H01L27/14627Y10S430/143H01L27/14685G03F1/144G03F7/0005G03F1/50H01L31/02327Y10T29/49002
Inventor 西孝
Owner 西 孝