Nano self cleaning silk broadcloth and products

A nano self-cleaning, real silk technology, applied in the field of textiles, can solve problems such as affecting performance, poor dyeing fastness of real silk, easy wrinkling and shrinkage during wearing and cleaning

Active Publication Date: 2006-09-27
韦钧千
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the dyeing fastness of real silk is poor, and it is easy to wrinkle and shrink during wearing and cleaning, which greatly affects its performance, and there is no report on the self-cleaning technology of real silk so far.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] Take 2g of silk yarn and put it into 5g / L of silicon oxide containing 24g / L of AG-710 organic fluororesin from Japan Asahi Glass Co., Ltd., 5g / L of average particle size of 30nm, 10g / L of γ-aminopropyltriethoxysilane, and 6g of 2D resin / L, magnesium chloride 0.1g / L and the water system of isopropanol 20g / L, bath ratio is 1: 20, soaks 30min at 40 ℃, squeezes liquid then, makes liquid squeezed rate 70%, puts into baking oven, in Pre-bake at 90°C for 5 minutes, and continue to bake at 110°C for 1.5 minutes to obtain nanometer self-cleaning silk yarn.

Embodiment 2

[0027]Cut the real silk knitwear into 5cm square samples. The 20g / L water system was used to spray the above-mentioned low-temperature air plasma-treated fabric, then put it into an oven, pre-baked at 70°C for 30min, and continued to bake at 100°C for 4min to obtain nanometer self-cleaning silk knitwear.

Embodiment 3

[0029] Cut the worsted silk fabric into 5cm square samples, put in 30g / L of AG-7000 organic fluorine resin from Japan Asahi Glass Co., Ltd., 30g / L of titanium oxide with an average particle size of 30nm, and 50g / L of vinyl triethoxysilane , in the water system of melamine resin 3g / L, magnesium chloride 0.1g / L and isopropanol 30g / L, bath ratio is 1: 60, soaks 30min at 40 ℃, squeezes liquid then, makes liquid squeeze rate 80%, puts Enter the oven, pre-bake at 90°C for 10 minutes, and continue to bake at 120°C for 2 minutes to obtain nanometer self-cleaning real silk worsted fabric.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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PUM

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Abstract

This is a self-clean real silk cloth and its productive method. It features are: To treat the real silk cloth with the organic fluorine regulator it is nano-grade inorganic solid grain, use to soak, to coat or to spray on them, to make their surface have water-distant and oil-distant function. The organic fluorine regulator contains: the organic fluorine resin 10-70g/L, nano-grade inorganic solid grain water 5-30g/L. In the advanced organic fluorine regulator also contain the silicon alkanet, magnesium chloride, or isopropyl alcohol at least one of above compositions.

Description

technical field [0001] The invention relates to a textile, in particular to a nanometer self-cleaning real silk and products manufactured by adopting nanotechnology. Background technique [0002] With the improvement of people's awareness of environmental protection and energy conservation and the improvement of people's living standards, new requirements have been put forward for the performance of materials, so fabrics with three anti-functions (that is, waterproof, oil-proof and dust-proof) have been developed. Research on material self-cleaning technology in China. For example, Japanese Patent Laying-Open No. 9-71437 discloses glass for windows with self-cleaning function, which is to provide a titanium oxide film on the surface of the glass. Japanese Patent Laying-Open No. 9-72761 discloses a glass cover for an instrument with a self-cleaning function, which also utilizes titanium oxide. [0003] It is recorded in Chinese patent CN 1284525A that the apparent contact a...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): D06M15/19
Inventor 韦钧千
Owner 韦钧千
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