Exposure process
An exposure method, rectangular technology, applied in the field of exposure, can solve problems such as difficulty in obtaining patterns and difficulty in the influence of 3θ aberration, and achieve the effect of reducing the fluctuation and suppressing the influence of 3θ aberration
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[0044] Embodiments of the present invention will be described below with reference to the drawings.
[0045] (Embodiment 1)
[0046] figure 1 Shown is a schematic configuration diagram of the exposure apparatus according to the present embodiment given in principle. It is basically the same as the usual exposure device, that is, the illumination light from the illumination system composed of the light source 1 and the illumination optical system 2 is irradiated onto the exposure mask 3 on which the desired mask pattern is formed, and through the projection lens The (projection optical system) 4 is an exposure device for projecting a pattern image formed by light passing through an exposure mask (reticle) 3 onto a wafer (semiconductor substrate) 5 . In addition, when the projection optical system includes a plurality of lenses, the projection lens 4 referred to here means a collection of the plurality of lenses, and can be considered to have optical characteristics equivalen...
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