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Polishing slurry for disk base sheet of memory hard disk

A technique for polishing slurry and memory, which is applied to polishing compositions containing abrasives, machine tools suitable for grinding the edge of workpieces, grinding/polishing equipment, etc. It can solve problems such as hard disks that cannot meet the requirements of memory, and achieve the goal of eliminating pits. Effect

Inactive Publication Date: 2003-05-14
TSINGHUA UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

According to the results of the inventor's research, as the hard disk manufacturers improve the surface processing quality of the memory hard disk substrate, the final surface roughness, waviness and The control of surface defects cannot meet the needs of memory hard drives

Method used

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  • Polishing slurry for disk base sheet of memory hard disk
  • Polishing slurry for disk base sheet of memory hard disk
  • Polishing slurry for disk base sheet of memory hard disk

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1-8

[0031] Under the condition of mechanical stirring, add the required amount of colloidal silicon dioxide (average particle size of primary particles: 40 nanometers) into deionized water for dispersion and dilution, then add the refined lubricant, balance solvent, and oxidant in sequence, and fully stir After homogeneity, add an appropriate amount of pH regulator to adjust the pH to the required range. The experimental samples of Examples 1-8 and Comparative Examples 1-3 were prepared by this method, and their specific proportions are shown in Table 1.

[0032] Dioxygen

Silicon

(wt%)

nitric acid

iron

(wt%)

lubricant

(wt%)

Balancer

(wt%)

pH

Example 1

4.0％

0.5％

fatty acid polyoxyethylene ether phosphate,

0.5%

Propylene Glycol, 1%

1.48

Example 2

5.5％

2％

Fatty acid polyoxyethylene ether phosphate, 2%

Propylene Glycol, 2%

1.90

Example 3

7.0％ ...

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PUM

PropertyMeasurementUnit
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Abstract

The present invention relates to the technology of manufacturing computer memory and hard disk. The polishing slurry contains abrasive, oxidant and water and is characterized by its water-soluble lubricant and polish balancing agent. The water-soluble lubricant is plyoxyethylenated fatly acid phosphate, plyoxyethylene fatty amide phosphate, fatty acid-polyol ester or their mixture and accounts for 0.2-20 wt%; and the polish balancing agent is water-soluble alcohol and accounts for 0.2-20 wt%. The polishing slurry can reduce the roughness and waviness of memory and hard disk surface to below 0.7 angstrom and eliminate effectively pit, lug, scratch and other faults.

Description

technical field [0001] The invention relates to a polishing slurry, in particular to a disk substrate polishing slurry used for memory hard disks, and belongs to the technical field of computer memory hard disk manufacturing. Background technique [0002] In recent years, with the rapid increase of memory hard disk capacity and storage density, the magnetic head is required to read smaller and weaker signals, so the distance between the magnetic head and the magnetic medium of the magnetic disk needs to be further reduced to increase the strength of the output signal. At present, the flying height of the commercial computer head has been reduced to about 10nm, and it is expected that the next generation will be reduced to 7-8nm, and some people have been conducting research on quasi-contact or even direct contact between the head and the disk. With the head running so close to the disk, the demands on the surface quality of the disk are getting higher and higher. When the s...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B24B9/02C09G1/02
Inventor 雒建斌雷红潘国顺路新春
Owner TSINGHUA UNIV
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