Growth of ferroelectric thick films with films as seeds by liquid phase epitaxy
A technology of liquid phase epitaxy and ferroelectric thick film, which is applied in the direction of liquid phase epitaxy layer growth, crystal growth, chemical instruments and methods, etc., to achieve the effect of convenient operation, low cost and controllable orientation
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Embodiment 1
[0016] 1. According to the stoichiometric ratio of 0.91PbZn 1 / 3 Nb 2 / 3 o 3 -0.09PbTiO 3 Carry out the batching of oxide raw materials;
[0017] 2. Add absolute ethanol as the medium, mill in an agate ball mill jar for 2 hours, dry the powder, put it into an alumina crucible, and calcinate at 900°C for 4 hours;
[0018] 3. Grind the calcined block material in an agate mortar for 15 minutes, and uniformly mix the ground powder with 50wt% PZNT and 50wt% lead oxide, and then press the uniformly mixed powder into a circle of Φ25mm piece;
[0019] 4. Put the powder into a sealed crucible, and raise the temperature to 1150°C in 2 hours, and keep it warm for 1 hour at this temperature for foaming;
[0020] 5. Lower the temperature to 1050°C, put the magnesium oxide substrate coated with YBCO seed film from the top to carry out epitaxial growth of PZNT ferroelectric thick film, and the growth time is 1 second.
Embodiment 2
[0022] 1. According to the stoichiometric ratio of 0.67PbMg 1 / 3 Nb 2 / 3 o 3 -0.33PbTio 3 Carry out the batching of oxide raw materials;
[0023] 2. Add absolute ethanol as the medium, mill in an agate ball mill jar for 1 hour, dry the powder, put it into an alumina crucible, and calcine at 850°C for 8 hours;
[0024] 3. Grind the calcined block material in an agate mortar for 15 minutes, and uniformly mix the ground powder with 45wt% PMNT and 55wt% lead oxide, and then press the uniformly mixed powder into a circle of Φ25mm piece;
[0025] 4. Put the powder into a sealed crucible, and raise the temperature to 1180°C in 4 hours, and keep it warm for 2 hours at this temperature for foaming;
[0026] 5. Lower the temperature to 1050°C, put the strontium titanate substrate coated with the PZT seed film from the top for epitaxial growth, the growth time is 10 seconds, and the thickness of the PMNT film is several microns.
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