In-situ preparing method for composite TiO2 and SiO2 thin film as photo-catalyst

A composite film, photocatalyst technology, applied in catalyst activation/preparation, chemical instruments and methods, physical/chemical process catalysts, etc., can solve the problems of high cost, difficult separation and recovery of powder, secondary pollution, etc.
CN1586712AInactive Publication Date: 2005-03-02WUHAN UNIV OF TECH

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
WUHAN UNIV OF TECH
Publication Date
2005-03-02
Estimated Expiration
Not applicable · inactive patent

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Abstract

The in-situ preparation process of composite TiO2 and SiO2 film as photocatalyst is one liquid phase deposition-heat treatment process. The process includes compounding supersaturated water solution with the material including ammonium fluorotitanate and / or titanium tetrafluoride and boric acid and / or aluminum powder; soaking glass suibstrate into the supersaturated water solution for some time; flushing the soaked glass suibstrate, stoving and high temperature heat treatment at 400-1100 deg.c to obtain the composite TiO2 and SiO2 film as photocatalyst. The process is simple.
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Description

technical field

[0001] The present invention relates to highly photoactive TiO 2 with SiO 2 The in-situ preparation method of composite thin film semiconductor photocatalyst, the invention also relates to the technical field of preparation of other composite semiconductor oxide thin film materials. technical background

[0002] In recent years, in order to solve the increasingly serious problem of environmental pollution, the research and development of highly active heterogeneous semiconductor photocatalytic materials has received extensive attention from governments and researchers all over the world. There are more and more research papers and patents in this area, and every year Thousands of research papers have been published, because this kind of photocatalytic materials can be widely used in the degradation of organic pollutants, water and air purification, sterilization and disinfection, self-cleaning ecological building materials and other fields, which have genera...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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