Unlock instant, AI-driven research and patent intelligence for your innovation.
Method for preparing green light sensitive holographic photoluminescent polymer and holographic recording dry plate
What is Al technical title?
Al technical title is built by PatSnap Al team. It summarizes the technical point description of the patent document.
A photopolymer and holographic recording technology, applied in optics, photosensitive materials, instruments, etc., can solve the problems of reducing the exposure sensitivity of materials and affecting the optical quality of the film surface
Inactive Publication Date: 2005-03-02
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
View PDF0 Cites 6 Cited by
Summary
Abstract
Description
Claims
Application Information
AI Technical Summary
This helps you quickly interpret patents by identifying the three key elements:
Problems solved by technology
Method used
Benefits of technology
Problems solved by technology
F.T.Neill et al etc. (F.T.Neill, J.R.Lawrence, J.T.Sheridan. "improvement of holographic recording material using aerosolsealant, J.Opt.A: PureAppl.Opt.3 (2001): 20-25) use aerosol as sealant, Instead of a glass slide, this was found to be a cheaper and easier way to isolate the photopolymer material from the air, but doing so would compromise the optical quality of the film surface and reduce the exposure sensitivity of the material
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more
Examples
Experimental program
Comparison scheme
Effect test
Embodiment 1
[0024] 1. The formula of the selected green light-sensitive holographic photopolymer is as follows:
[0031] The preparation method of the green light-sensitive holographic dry plate, its preparation process is:
[0032] (1) firstly add 60wt% polyvinyl alcohol into distilled water, heat on a constant temperature magnetic heating stirrer, the temperature is controlled at 80°C, and after it is fully dissolved, 7wt% polyvinyl alcoholaqueous solution is obtained;
[0033] (2) Fully dissolve 0.18wt% phycoerythrin B dye in distilled water, and prepare 2.5×10 -3 mol L -1 solution;
[0051] The resulting photopolymer holographic dry plate has a diffraction efficiency of 37% and an exposure sensitivity of 62mJ / cm 2 .
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More
PUM
Login to View More
Abstract
The invention is a green light sensitive holographic photopolymer and a method of preparing holographic record dry plate, where the photopolymer is composed of film-forming polyvinyl alcohol, monomeric acylamide and diacylamide, photosensitive agent phycoerythrin B, initiator N-phenylglycine and plasticizing agent. The preparing course of the holographic dry plate: firstly dissolving the polyvinyl alcohol in the distilled water to make 7% (wt) polyvinyl alcohol water solution; secondly, adding acylamide crystals and methylene diacylamide crystals as well as N-phenylglycine and plasticizing agent to the polyvinyl alcohol water solution; thirdly, adding in phycoerythrin B dissolved in the distilled water; fourthly, pouring the above sol onto a basal plate and after the water is completely volatilized, making the photopolymer holographic drying plate. It is sensitive to the green light and the environmental humidity has a little effect on it, and it has strong shrink resistance, short drying time, diffraction efficiency able to reach 65%, and exposure strength 50 mJ / sq cm and it is especially applied to dry-processing of optical holographic record.
Description
technical field [0001] The invention relates to holographic storage, in particular to a green light-sensitive holographic photopolymer for holographic storage and a preparation method for a holographic recording dry plate. The holographic dry plate of the present invention is especially suitable for digital holographic storage on-line by dry method. Background technique [0002] Holographic storage is a large-capacity and high-storage-density storage method that emerged with the development of laserholography after the invention of high-coherence light sourcelaser in the 1960s. Compared with traditional storage methods, it has high redundancy, high storage capacity, The advantages of fast data transfer rate, fast access time, and parallel content addressing are highly valued in the field of optical information storage. The application of digital holographic storage largely depends on whether there is a suitable dry method for online processing of holographic recording med...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More
Application Information
Patent Timeline
Application Date:The date an application was filed.
Publication Date:The date a patent or application was officially published.
First Publication Date:The earliest publication date of a patent with the same application number.
Issue Date:Publication date of the patent grant document.
PCT Entry Date:The Entry date of PCT National Phase.
Estimated Expiry Date:The statutory expiry date of a patent right according to the Patent Law, and it is the longest term of protection that the patent right can achieve without the termination of the patent right due to other reasons(Term extension factor has been taken into account ).
Invalid Date:Actual expiry date is based on effective date or publication date of legal transaction data of invalid patent.
Login to View More
IPC IPC(8): G03C1/00
Inventor 弓巧侠顾冬红黄明举干福熹
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI