Radiation sensitive resin composition, gap, its forming method and LCD element
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A technology of resin composition and radiation, which is applied in the fields of electrical components, nonlinear optics, semiconductor/solid-state device manufacturing, etc., and can solve problems such as poor display components and poor development
Inactive Publication Date: 2005-11-16
JSR CORPORATIOON
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At this time, when the unexposed part is dissolved and removed after the space is formed, the photopolymerization initiator is precipitated in the developing solution after development, and the precipitated photopolymerization initiator is attached to the substrate again to cause defective display elements. Problems such as poor development caused by the precipitation of photopolymerization initiator in the developing nozzle
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[0148] Hereinafter, examples and comparative examples are shown, and the present invention will be described more specifically, but the present invention is not limited to these examples.
Synthetic example 1
[0150] In a flask equipped with a cooling tube and a stirrer, add 5 parts by weight of 2,2'-azobis(2,4-dimethylvaleronitrile), 200 parts by weight of diethylene glycol methyl ethyl ether, and then continue Pack 18 parts by weight of methacrylic acid, 40 parts by weight of glycidyl methacrylate, 5 parts by weight of styrene, 32 parts by weight of methacrylic acid tricyclic [5.2.1.0 2，6 ] Decane-8-yl, after nitrogen replacement, add 5 parts by weight of 1,3-butadiene while stirring slowly, make the solution temperature rise to 70 ° C, keep at this temperature for 5 hours and polymerize to obtain a copolymer [ A-1] solution.
[0151] The solid content concentration of the solution was 33.0% by weight, and the Mw of the copolymer [A-1] was 11,000.
Synthetic example 2
[0153] In a flask equipped with a cooling tube and a stirrer, add 7 parts by weight of 2,2'-azobis(2,4-dimethylvaleronitrile), 200 parts by weight of diethylene glycol methyl ethyl ether, and then continue Load 18 parts by weight of methacrylic acid, 20 parts by weight of glycidyl methacrylate, 5 parts by weight of styrene, 32 parts by weight of methacrylic acid tricyclic [5.2.1.0 2，6 ]decane-8-yl, 25 parts by weight of tetrahydrofurfuryl methacrylate, after nitrogen replacement, the temperature of the solution was raised to 70°C while stirring slowly, kept at this temperature for 5 hours and polymerized to obtain the copolymer [A -2] solution.
[0154] The solid content concentration of this solution was 33.4% by weight, and the Mw of the copolymer [A-2] was 9,000.
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Abstract
The present invention provided a radiation sensitive resin composition which has high sensitivity, can faithfully reproduce the design size of a mask pattern, is superior in adhesion to a substrate, makes it possible to obtain a satisfactory spacer shape and thickness with an exposure energy of <=1,500 J / m2, solves the problem of deposition of a photopolymerization initiator in a developing solution, and can form spacers for a liquid crystal display element which is superior also in strength and heat resistance. The radiation sensitive resin composition contains (A) a copolymer of (a1) an ethylenically unsaturated carboxylic acid and / or an ethylenically unsaturated carboxylic acid anhydride, (a2) an epoxy-containing ethylenically unsaturated compound and (a3) another ethylenically unsaturated compound, (B) a polymerizable compound having an ethylenically unsaturated bond and (C) a photopolymerization initiator, wherein the content of the photopolymerization initiator (C) is 0.1-5 pts.wt., with respect to 100 pts.wt. of the polymerizable compound (B).
Description
technical field [0001] The present invention relates to a radiation-sensitive resin composition, a spacer, a method for forming the same, and a liquid crystal display element. Background technique [0002] In liquid crystal display elements, spacer particles such as glass beads and plastic beads with a predetermined particle size have been used in the past to maintain a space (cell space) between two substrates. Free scattering, if spacer particles exist in the image forming region, the imprinting phenomenon of the spacer particles will occur, the incident light will be scattered, and there is a problem that the contrast of the liquid crystal display element will be lowered. [0003] Therefore, in order to solve this problem, a method of forming a spacer by photolithography is employed. In this method, a radiation-sensitive resin composition is coated on a substrate, a predetermined mask is inserted and developed during ultraviolet exposure to form dot-shaped or stripe-shap...
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