Production and producer for cadmium sulfide

Abstract

The method includes: 1) washing up and drying the substrate; placing the substrate against the reactor wall; 2) preparing material solution by using cadmium salt, ammonium salt, organic compounds containing sulfur and ammonia; filling the material solution into the reactor until top of substrate is submerged; 3) putting the reactor into thermostatic chamber, and keeping the water temperature from 70íµ to 95íµ, and introducing 20- 60 khz ultrasonic wave to react 10-60 min.; 4) after completing reaction, cleaning up it by using osculation of distilled water and ultrasonic wave of ammonium nitrate. The facility thereof consists of a medium solution heater, a thermostatic chamber, a booster pump located between heater and thermostatic chamber, a suspension gear located at upper portion of thermostatic chamber and hanging in the thermostatic room. At the bottom of the thermostatic chamber there is an ultrasound transducer.

Description

technical field [0001] The invention relates to a production process and equipment for a cadmium sulfide film, in particular to a production process and equipment for a cadmium sulfide film formed by combining ultrasonic technology with a chemical water bath method. Background technique [0002] Cadmium sulfide thin films are widely used in solar cells, sensors, photodetectors, laser materials, optical waveguide devices and nonlinear integrated optical devices and other fields. At present, the preparation methods of cadmium sulfide film mainly include: molecular beam epitaxy growth method, vacuum thermal evaporation method, laser evaporation method, chemical vapor deposition method, electrodeposition method and chemical water bath method, etc. Molecular beam epitaxy growth method, vacuum thermal evaporation method, laser evaporation method and chemical vapor deposition method require high vacuum and large equipment, large investment and high productio...

AI Technical Summary

Problems solved by technology

Molecular beam epitaxy growth method, vacuum thermal evaporation method, laser evaporation method and chemical vapor deposition method require high vacuum and large equipment, large investment and high production cost

The electrodeposition process is more complicated, and it is easy to introduce other chemical substances into the film

At present, more water bath methods are used, and the substrate is usually placed in the center of the solution, which causes heat to be transferred to the reaction solution first, and then to the substrate through the reaction solution, so there is a cadmium sulfide in the solution or on the container wall during the preparation process. The process of pre-nucleation and growth, and then nucleation on the substrate, the prepared cadmium sulfide film is likely to contain precipitated particles in the solution, resulting in more pores, so the uniformity and compactness of the film are not ideal; and Because nucleation occurs on the wall first, and then on the substrate, the reaction requires more solutions and takes a long time; the reaction rate can only be estimated based on the distance from the substrate to the wall, which is difficult to control Reaction process, not suitable for large-scale production

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