The invention relates to a method of using a thermal
laser evaporation (TLE)
system (10), the TLE
system (10) comprising: a
reaction chamber (12) fillable with a reaction
atmosphere (14); a substrate (16) arranged in the
reaction chamber (12); one or more sources (40) arranged in the
reaction chamber (12), each source (40) comprising a source component (50) consisting of a
source material (52); and a
laser source (20) for providing a heating
laser beam (22) that irradiates an upper surface (60) of the source
assembly (50) with a heating spot (24) to vaporize or sublimate the
source material (52) from an active area (62) on the upper surface (60) of the source
assembly (50) to provide a flux (54) of the vaporized or sublimated
source material (52) for deposition onto the substrate (16). Further, the invention relates to a thermal
laser evaporation (TLE)
system (10), the TLE system (10) comprising: a reaction chamber (12) fillable with a reaction
atmosphere (14); a substrate (16) arranged in the reaction chamber (12); one or more sources (40) arranged in the reaction chamber (12), each source (40) comprising a source component (50) consisting of a source material (52); and a
laser source (20) for providing a heating laser beam (22) that irradiates an upper surface (60) of the source
assembly (50) with a heating spot (24) to vaporize or sublimate the source material (52) from an active area (62) on the upper surface (60) of the source assembly (50) to provide a flux (54) of the vaporized or sublimated source material (52) for deposition onto the substrate (16).