18 results about "Laser evaporation" patented technology

The present invention relates to a beamline (10) for a laser beam (220) of a thermal laser evaporation (TLE) system (300), the beamline (10) extending between a source end (20) of the beamline (10) and a chamber end (30) of the beamline (10), such that the source end (20) is connectable to a laser light source (210) and the chamber end (30) is connectable to a reaction chamber (310) of the TLE system (300), the beamline (10) including one or more laser beam sources (210) for modifying and / or controlling the characteristics of the laser beam (220). and / or one or more linear guiding sections (52), each of the optical section (50) and the guiding section (52) having an upstream end (60) with a first connection interface (64), a downstream end (66) with a second connection interface (70), and a section cavity (56) extending continuously within the housing (54) from the first section opening (62) at the upstream end (60) to a second section opening (68) at the downstream end (66). The present invention further relates to a laser system (200) for a TLE system (300), the laser system (200) comprising a laser source (210) for providing a laser beam (220), and the beamline (10). The present invention further relates to a TLE system (300) comprising a reaction chamber (310) that can be filled with a reaction atmosphere (312), a substrate (316) disposed in the reaction chamber (310), one or more sources (314) disposed in the reaction chamber (310), and a laser system (200) for providing a laser beam (220) for evaporating and / or sublimating material from the sources (314) and / or for heating material from the substrate (316).

The present invention is related to a thermal laser evaporation system (10), the thermal laser evaporation system (10) comprising:a reaction chamber (20) with a chamber wall (30) for enclosing a reaction volume (22);a target (12) arranged in the reaction volume (22), the target comprising one or more materials (M) to be evaporated;a laser light source (40) for providing a thermal laser beam (42) for evaporating said one or more materials (M) from the target (12), the thermal laser beam having a general propagation direction (46); anda chamber window (38) in the chamber wall (30) for conducting the thermal laser beam (42) into the reaction volume (22).

Method for producing a hydrophilic cover layer (1) of a sensor membrane (2) which has a contact angle q of < 90° with water, comprising - providing a sensor membrane (2) comprising a medium-facing silicone film (3), - Coating the silicone film (3) with diamond-like carbon (DLC), wherein the coating step is selected from physical vapor deposition (PVD), chemical vapor deposition (CVD), for example by ECR (electron cyclotron resonance)-CVD, laser evaporation and sputtering, preferably magnetron sputtering, whereby a cover layer (1) is formed which, during operation, comes into contact with the medium and comprises the diamond-like carbon coating (5) and the silicone film (3), - Treating the cover layer (1) with a sterilizing agent.

The invention relates to a method of using a thermal laser evaporation (TLE) system (10), the TLE system (10) comprising: a reaction chamber (12) fillable with a reaction atmosphere (14); a substrate (16) arranged in the reaction chamber (12); one or more sources (40) arranged in the reaction chamber (12), each source (40) comprising a source component (50) consisting of a source material (52); and a laser source (20) for providing a heating laser beam (22) that irradiates an upper surface (60) of the source assembly (50) with a heating spot (24) to vaporize or sublimate the source material (52) from an active area (62) on the upper surface (60) of the source assembly (50) to provide a flux (54) of the vaporized or sublimated source material (52) for deposition onto the substrate (16). Further, the invention relates to a thermal laser evaporation (TLE) system (10), the TLE system (10) comprising: a reaction chamber (12) fillable with a reaction atmosphere (14); a substrate (16) arranged in the reaction chamber (12); one or more sources (40) arranged in the reaction chamber (12), each source (40) comprising a source component (50) consisting of a source material (52); and a laser source (20) for providing a heating laser beam (22) that irradiates an upper surface (60) of the source assembly (50) with a heating spot (24) to vaporize or sublimate the source material (52) from an active area (62) on the upper surface (60) of the source assembly (50) to provide a flux (54) of the vaporized or sublimated source material (52) for deposition onto the substrate (16).

The present invention relates to a method of using a thermal laser evaporation (TLE) system, the system comprising a reaction chamber capable of being filled with a reaction atmosphere, one or more sources arranged in the reaction chamber, each source comprising a source material, and a laser light source for providing laser radiation to a surface of the source, thereby evaporating the source material.The present invention further relates to a thermal laser evaporation system comprising a reaction chamber capable of being filled with a reaction atmosphere, one or more sources arranged in the reaction chamber, each source comprising a source material, and coupling means provided by the reaction chamber for coupling the laser radiation into the reaction chamber for evaporating the source material by impinging on a surface of the source.

The invention is related to a method of using a thermal laser evaporation (TLE) system (100), the system (100) comprising a reaction chamber (10) fillable with a reaction atmosphere (14), one or more sources (30) arranged in the reaction chamber (10), each source (30) comprising a source material (32), and a laser source (50) for providing laser radiation (52) at a surface (34) of the source (30) and thereby evaporating the source material (32). Further, the invention is related to a thermal laser evaporation system (100) comprising a reaction chamber (10) fillable with a reaction atmosphere (14), one or more sources (30) arranged in the reaction chamber (10), each source comprising a source material (32), and coupling means (12) provided by the reaction chamber (10) for coupling laser radiation (52) into the reaction chamber (10) for impinging on a surface (34) of the source (30) and thereby evaporating the source material (32).

This invention provides an intelligent dimming laminated vacuum composite roof glass structure and its manufacturing method, comprising an outer tempered or semi-tempered glass, a film layer, an EC-coated glass, an edge sealing layer, and an inner vacuum glass layer, stacked sequentially from the outside of the roof to the inside of the vehicle. The EC-coated glass and the inner vacuum glass are edge-sealed by the edge sealing layer to form an EC-coated insulated glass structure. Then, a getter is activated by laser evaporation to adsorb air from the insulated glass structure, forming an EC-coated vacuum glass structure. The film layer is then laminated and fixed to the outer tempered or semi-tempered glass to form a laminated vacuum composite structure. Multiple vacuum support pillars are provided on the side of the inner vacuum glass facing the EC-coated glass to form and maintain the vacuum cavity. This invention uses vacuum glass to isolate external heat conduction, combined with the active modulation of visible light and infrared radiation by the EC-coated glass, to achieve intelligent temperature regulation, significantly improving driving comfort.

The invention relates to a method of using a thermal laser evaporation (TLE) system (10), the TLE system (10) comprising: a reaction chamber (12) that can be filled with a reaction atmosphere (14); a substrate (16) arranged in the reaction chamber (12); one or more sources (40) arranged in the reaction chamber (12), each source (40) comprising a source component (42) consisting of a source material (44); and a laser source (20) for providing a laser beam (22) that impinges on the source assembly (42) to vaporize or sublimate the source material (44) to provide a flux (70, 72) of vaporized or sublimated source material (44) for deposition on the substrate (16). Further, the invention relates to a corresponding TLE system, the TLE system (10) comprising: a reaction chamber (12), which can be filled with a reaction atmosphere (14); a substrate (16) arranged in the reaction chamber (12); one or more sources (40) arranged in the reaction chamber (12), each source (40) comprising a source component (42) consisting of a source material (44); and a laser source (20) for providing a laser beam (22) that impinges on the source assembly (42) to vaporize or sublimate the source material (44) to provide a flux (70, 72) of vaporized or sublimated source material (44) for deposition on the substrate (16).

The invention provides a composite welding method of outer-layer laser beam surrounding type rotation auxiliary high-power laser, and belongs to the technical field of laser material processing. In the welding process, the inner-layer high-power laser beam acts on the surface of a workpiece to be welded and forms a key hole, and the outer-layer low-power rotating laser beam rotates around the key hole generated by the inner-layer high-power laser beam, so that laser evaporation steam on the wall face of the key hole is accurately regulated and controlled, the wall face of the key hole is stressed more uniformly, and then collapse of the key hole is restrained. According to the outer-layer laser beam surrounding type rotation auxiliary high-power laser hybrid welding method, the welding process is more stable, the quality of obtained welding seams is high, and defects such as air holes, collapse and cracks are not prone to being formed.

The application provides a kind of polymer nanometer film and its preparation method, belongs to the field of polymer film material.Preparation method is: conductive polymer material is dissolved in solvent, then is frozen into sample tank, again sample tank is placed in vacuum chamber, the substrate in front of sample tank is preheated, then the solution frozen in sample tank is deposited using medium assisted pulsed laser evaporation technology, to obtain original film, finally the original film is annealed, acid treated and dried to obtain polymer nanometer film.The crystallinity of polymer nanometer film is 60% to 90%, the thickness is 50nm to 450nm, and the conductivity is 0.01S / cm to 100S / cm.Compared with the film prepared by solution method, the polymer nanometer film of the application does not contain stabilizer component, has high crystallinity, excellent electrical properties and is easy to scale production.

The utility model relates to the field of evaporation coating, in particular to an evaporation coating device, which comprises an evaporation coating unit, a vacuum chamber and an evaporation coating unit, the evaporation coating unit enables evaporation substances evaporated from an evaporation coating source to be subjected to evaporation coating on a base film, and the vacuum chamber is used for setting a space for arranging the evaporation coating source and the base film and can keep the space in a vacuum state. And the laser evaporation unit is positioned in the vacuum chamber and is used for emitting high-power laser to evaporate the evaporation coating source. According to the device, a high-power laser beam is emitted through a laser emitter and is aligned with the surface of an evaporation coating source on a tray to perform scanning type irradiation, the surface layer of the evaporation coating source is evaporated through the laser beam, and an evaporation substance is deposited on the surface of a base film to form a thin film. According to the evaporation mode, resistance heating is not needed, splashing generated by corrosion of a resistance material and mixing of molten aluminum is reduced, poor products generated by resistance fluctuation in long-time production are reduced, and the yield of the products is greatly increased.

The invention is related to a method of using a thermal laser evaporation (TLE) system (100), the system (100) comprising a reaction chamber (10) fillable with a reaction atmosphere (14), one or more sources (30) arranged in the reaction chamber (10), each source (30) comprising a source material (32), and a laser source (50) for providing laser radiation (52) at a surface (34) of the source (30) and thereby sublimating the source material (32). Further, the invention is related to a thermal laser evaporation system (100) comprising a reaction chamber (10) fillable with a reaction atmosphere (14), one or more sources (30) arranged in the reaction chamber (10), each source comprising a source material (32), and coupling means (12) provided by the reaction chamber (10) for coupling laser radiation (52) into the reaction chamber (10) for impinging on a surface (34) of the source (30) and thereby sublimating the source material (32).

The present invention relates to a beam line (10) for a laser beam (220) of a thermal laser evaporation (TLE) system (300), the beam line (10) extending between a source end (20) of the beam line (10) and a chamber end (30) of the beam line (10), whereby the source end (20) is connectable with a laser source (210) and the chamber end (30) is connectable with a reaction chamber (310) of the thermal laser evaporation system (300), the beam line (10) comprising: one or more optical sections (50), one or more linear guide sections (52) for changing and / or controlling properties of the laser beam (220), and / or one or more linear guide sections (52); wherein each optical section (50) and guide section (52) respectively comprise a housing (54) having an upstream end (60) comprising a first connection interface (64), a downstream end (66) comprising a second connection interface (70), and a section cavity (56) extending continuously within the housing (54) from a first section opening (62) located in the upstream end (60) to a second section opening (68) located in the downstream end (66). Furthermore, the invention relates to a laser system (200) for a thermal laser vapor deposition system (300), comprising a laser source (210) for providing a laser beam (220) and a corresponding beam line (10). Furthermore, the invention relates to a thermal laser vapor deposition system (300) comprising a reaction chamber (310) that can be filled with a reaction atmosphere (312); a substrate (316) disposed in the reaction chamber (310); one or more sources (314) arranged in the reaction chamber (310); and a corresponding laser system (200) for providing a laser beam (220) for evaporating and / or sublimating the material of the source (314) and / or heating the material of the substrate (316).

The invention relates to a method for heating a substrate (20), in particular a substrate (20) of a thermal laser evaporation (TLE) system (10). Furthermore, the invention relates to a substrate heater (30) for heating a substrate (20), in particular a substrate (20) of a TLE system (10), comprising a laser light source (32) for providing a laser beam (34) and means for guiding the laser beam (34) to the substrate (20). Furthermore, the invention relates to a TLE system (10) comprising a reaction chamber (12) fillable with a reaction atmosphere (14), a substrate (20) disposed in the reaction chamber (12), one or more sources (16) disposed in the reaction chamber (12), and a substrate heater (30) for providing a laser beam (34) impinging on the substrate (20) to heat the substrate (20).

The invention relates to a method of using a thermal laser evaporation (TLE) system. The TLE system comprising a reaction chamber fillable with a reaction atmosphere, a substrate arranged in the reaction chamber, and one or more sources arranged in the reaction chamber. Each source comprising a source element including a source material, and a laser source for providing a laser beam impinging on the source element and thereby evaporating or sublimating the source material for providing a flux of evaporated or sublimated source material for a deposition onto the substrate.

The invention relates to a beam line for a laser beam of a thermal laser evaporation (TLE) system. The beam line extends between a source end of the beam line and a chamber end of the beam line. The source end is connectable to a laser source and the chamber end is connectable to a reaction chamber of the TLE system.

The present invention relates to a method of using a thermal laser evaporation (TLE) system (100), comprising a reaction chamber (10) capable of being filled with a reaction atmosphere (14), one or more sources (30) arranged in the reaction chamber (10) each comprising a source material (32), and a laser source (50) for providing laser radiation (52) to a surface (34) of the source (30) for sublimating the source material (32). The present invention further relates to a thermal laser evaporation system (100), comprising a reaction chamber (10) capable of being filled with a reaction atmosphere (14), one or more sources (30) arranged in the reaction chamber (10) each comprising a source material (32), and coupling means (12) provided by the reaction chamber (10) for coupling the laser radiation (52) into the reaction chamber (10) for incident laser radiation (52) on a surface (34) of the source (30) for sublimating the source material (32).

The present invention discloses a composite plate impregnation and masking process, comprising the following steps: step 1, affixing a protective film to the area of the plate to be impregnated; step 2, vapor-depositing thermal zirconium oxide using an evaporation device, and coating the area on the plate not covered by the protective film; step 3, tearing off the protective film on the surface of the plate after coating, and then starting the impregnation process; step 4, after the impregnation is completed, cooling and solidifying the coated zirconium dioxide, and then stripping after the curing is completed. The protective film in step 1 is provided with a hollow portion identical to the vapor-deposited area, and the vapor-depositing device in step 2 evaporates the zirconium dioxide by laser evaporation or magnetron sputtering, and then adheres to the area on the plate not blocked by the protective film. The present invention effectively improves the masking density, prevents the infiltration of dyeing liquid, does not leave residual offset, ensures the finished product effect, can effectively reduce manpower consumption, and improves work efficiency.