Composition for separating photoresist and separating method
A technology of photoresist and composition, applied in the preparation of detergent mixture composition, detergent composition, non-surface active detergent composition, etc., can solve the problems of reduced yield, insoluble matter precipitation, adhesion Solve problems such as on the substrate to achieve high performance and prevent aluminum corrosion
Inactive Publication Date: 2006-12-06
NAGASE CHEMTEX CORPORATION
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Problems solved by technology
In the case where rinsing with organic solvents must be followed by rinsing with water, there is a problem of complicated production processes
On the other hand, if the substrate is rinsed directly with water instead of organic solvents such as alcohol, the production process is not complicated, but insoluble matter will precipitate out and adhere to the substrate again during the rinse process. Can adversely affect device performance and reduce yield
Method used
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[0025] According to the present invention, the composition for stripping a photoresist (hereinafter also simply referred to as "the composition of the present invention") comprises a compound selected from compounds represented by the following general formula (I), represented by the following general formula (II) At least one compound (A) among the compound, the compound represented by the following general formula (III), and the compound represented by the following general formula (IV). In general formula (I)~(IV), R 1 and R 3 Each independently represents a direct bond, or represents a linear or branched divalent hydrocarbon group with 1 to 5 carbon atoms; R 2 Represents a linear or branched divalent hydrocarbon group with 1 to 5 carbon atoms; examples of the divalent hydrocarbon group with 1 to 5 carbon atoms include methylene, ethylene, trimethylene, tetramethylene A group, and a propylene group, which may be a straight chain or have a methyl group, an ethyl group, etc...
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Abstract
Disclosed is a composition for separating a photoresist which contains a reaction product of a primary or secondary organic amine having a hydroxyl group with an ethylene carbonate, propylene carbonate, gamma-butylolactone, 1,3-dihydroxy-2-propanone, or a monovalent or divalent carboxylic acid, if necessary an organic amine, and a water-soluble organic solvent and / or water. This composition is capable of removing a photoresist with high performance and preventing corrosion of a metal wiring material. By using such a composition, there occurs no problem such that impurities precipitate and adhere to the substrate or the like during water rinsing after separation.
Description
technical field [0001] The present invention relates to a composition for photoresist stripping, which is used in various fields such as the production of semiconductor integrated circuits and the production of semiconductor element circuits for liquid crystal displays; the present invention also relates to the use of the composition Method for stripping photoresist. More specifically, the present invention relates to a composition for stripping a photoresist capable of removing redundant Photoresist residue. Background technique [0002] Photoresists are typically used in the manufacture of semiconductor integrated circuits, semiconductor element circuits for liquid crystal displays, and the like. This photoresist is peeled from materials such as a substrate by using the composition for peeling. For example, a semiconductor element circuit or its adjacent electrodes are manufactured in the following manner. Apply photoresist uniformly to metal film or SiO 2 On an insul...
Claims
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IPC IPC(8): G03F7/42H01L21/027H01L21/304C11D7/32C11D11/00H01L21/311
CPCC11D11/0047G03F7/425H01L21/31133C11D7/3263C11D2111/22G03F7/42
Inventor 西岛佳孝松本昌岳安江秀国武井瑞树
Owner NAGASE CHEMTEX CORPORATION