Method and system for forming a film of material using plasmon assisted chemical reactions

A plasma and chemical reaction technology, applied in microstructure or nanostructure and its application fields, can solve the problems of film quality deterioration and achieve the effects of fast heat generation, high device yield, and good space control

Inactive Publication Date: 2007-01-10
CALIFORNIA INST OF TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

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  • Method and system for forming a film of material using plasmon assisted chemical reactions
  • Method and system for forming a film of material using plasmon assisted chemical reactions
  • Method and system for forming a film of material using plasmon assisted chemical reactions

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Example Embodiment

[0081] Examples:

[0082] In order to verify the principle and operation of the present invention, we provide embodiments of the present invention in a chemical vapor deposition environment. These examples are only illustrative and should not limit the scope of the claims. Those of ordinary skill in the art should recognize many changes, improvements and substitutions. As background information, we provide information about traditional chemical vapor deposition and its applications related to the method and system of the present invention. One of the goals of this CVD study is to locally control nanostructures. Ferroelectric materials are ideal for non-volatile memory applications. However, there are challenges in manufacturing uniform nano-sized arrays of ferroelectric materials. Traditional CVD only provides a random deposition process, so it has limitations.

[0083] In this embodiment, the local heating of metal nanostructures (such as particles, wires or arrays on the substra...

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Abstract

The present disclosure methods and systems that provide heat, via at least Photon-Electron resonance, also known as excitation, of at least a particle utilized, at least in part, to initiate and/or drive at least one catalytic chemical reaction. In some implementations, the particles are structures or metallic structures, such as nanostructures. The one or more metallic structures are heat at least as a result of interaction of incident electromagnetic radiation, having particular frequencies and/or frequency ranges, with delocalized surface electrons of the one or more particles. This provides a control of catalytic chemical reactions, via spatial and temporal control of generated heat, on the scale of nanometers as well as a method by which catalytic chemical reaction temperatures are provided.

Description

[0001] Cross References to Related Applications [0002] This application claims priority to commonly assigned US Provisional Application No. 60 / 529869, filed December 15, 2003, which is hereby incorporated by reference. Background of the invention [0003] The present invention relates to the processing of materials, in particular microstructures or nanostructures, and their use. More specifically, the present invention provides methods and resulting structures for forming nanostructures and microstructures using deposition techniques for a wide variety of applications. By way of example only, such deposition techniques may be used to form one or more films in the fabrication of electronic devices such as integrated circuits. It should be recognized, however, that the invention has broader utility. The invention can be used for etching, enhancing chemical reactions, and the like. Furthermore, the present invention can be used in various fields including life sciences, chem...

Claims

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Application Information

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IPC IPC(8): C23C16/46C23C16/48C23C16/52C23C18/14
CPCB01J19/0046B01J2219/00495B01J2219/00527B01J2219/00747B82Y30/00C23C16/483C23C16/48C23C16/511C23C16/52
Inventor 大卫·A·博伊德马克·布罗恩格斯马莱斯利·格林葛德
Owner CALIFORNIA INST OF TECH
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