Multi-color photoelectric coating procedure and its products

Abstract

The invention discloses a preparation process of a multicolor photoelectric coating and its product. The main process is to anti-white print cleaned substrate of needed painting by lithographic printing so that pictorial is covered in the printed oil and the printed substrate placed on the coating machine for coating. Single color graphics tablet is obtained after the substrate coating on with printing of oil cleaned. Multicolor designs are obtained in a single substrate by the circulation of duplication and printing, coating and cleaning printing oil.

Description

technical field [0001] The invention relates to a multi-color photoelectric coating process and its products, especially a process for forming a multi-color photoelectric coating by chemical etching, which generally belongs to the application of photoelectric coating and is applied to the technical field of optical products. Background technique [0002] From the discovery of phenomena such as the surface of soap foam, the gap between glass surfaces, and the color reflected from oil slicks on the water surface, thin film optics has become a researched science, and with the development of vacuum technology, computers, control technology and materials in the 20th century Advances in technology have made the production of multilayer films a feasible fact and further commercial use. In today's field of optoelectronic technology, optical thin film technology has become a tool to control the spectrum of light beams. It can effectively change and control the spectral characteristic...

AI Technical Summary

Problems solved by technology

[0006] (1) Laser Etching (Laser Etching): mainly by carbon dioxide (CO 2 ) laser light (10.6μm) is focused by the lens to generate high heat, after melting and vaporizing the coating material, the coating material is adsorbed and deposited on the substrate, so that the substrate produces a thin film and then forms the desired pattern, while the general Coating materials such as titanium dioxide (TiO 2 ) melting point (2000°C) and silicon dioxide (SiO 2 ) melting point (1700°C) is higher than the melting point of the substrate such as glass (700°C). The pattern on the surface will produce fuzzy fogging and poor light transmission, and the edges of the engraved and unengraved parts will make the adhesion of the film poor, and the film will fall off when used at high temperature, which will reduce the quality of the manufactured GOBO , which is also the main disadvantage of laser engraving. In addition, only one-color engraving can be performed on a single piece of glass at a time, which reduces the process efficiency. To form a multi-color pattern piece, multiple pieces of glass need to be glued together. However, the adhesive material used will affect the penetration rate of the GOBO sheet. In addition, the jigs required for multi-piece glass gluing will be relatively larger, and the way of multi-piece glass gluing will affect the positioning of the pattern. There will be deviations, and the multi-color pattern sheets produced by gluing will fall off under the use of high-power lights. Moreover, laser engraving equipment is more expensive, and its cost is the highest in comparison. Therefore, as long as there is Relevant laser etching equipment can produce GOBO products, but due to the high production cost and easy damage to the substrate, although products with GOBO effects can be produced, high-quality GOBO cannot be produced.

[0007] (2) Chemical etching (Etching): This is the most commonly used method in the industry at present. This method is mainly based on the melting of coating materials such as titanium dioxide (TiO2) by chemical agents (hydrofluoric acid; HF). 2 ) and silicon dioxide (SiO 2 ) and so on and cannot melt the properties of printing oil to make GOBO. Due to the corrosion method, its power cannot be as good as the general coating conditions, so a lower output power must be used, and the low power output will cause the formed film to be denser. Insufficient resistance will cause thermal drift. The used chemicals such as hydrofluoric acid will also corrode the substrate such as glass. Therefore, when the etching temperature, concentration and time are not well controlled, the glass substrate will be fogged. The phenomenon of thinning makes the light transmittance of the uncoated area poor. Although the cost of chemical etching is low, it is limited by the quality of the film. When the density of the film is low, the chemical is easier to etch on the chip. pattern, but there will be thermal drift in the use of the chip, and when the density of the film is better, the difficulty of hydrofluoric acid melting the coating material will increase, although the etched chip has no thermal drift in use However, because it is not easy to etch, it is easy to damage the substrate, and when the film is used at high temperature, the film layer will fall off. Therefore, the biggest difficulty in chemical etching is how to control the hydrofluoric acid to only melt the coating material and not corrode it. Moreover, hydrofluoric acid is a strong acid that can easily cause harm to the human body and the environment. In addition, to form multi-color pattern sheets, multiple pieces of glass must be glued together, and the penetration rate of the adhesive material used for the GOBO sheet It will be affected. In addition, the fixture required for multi-piece glass gluing will be relatively enlarged, and the way of multi-piece glass gluing will also cause deviations in the positioning of the pattern, and the multi-color produced by gluing The gobos may also fall off under the use of high-power lights

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