Container box for framed pellicle

Abstract

There is provided a pellicle container for use in photolithography, with which no dust particles are deposited onto the pellicle contained therein, and contamination of the pellicle can be prevented and good condition is ensured. The present invention provides a pellicle container consisting of a container base on which a pellicle is mounted, and a covering body that covers the pellicle and latches with the container base by engagement together with the container base along the peripheral edges, wherein the pellicle is supported by inserting a frame supporting pin in the opening of a sleeve provided on the outside surface of the pellicle frame. Preferably, the container base is made from a plastic resin and a metal component is joined to the container base; the metal component fixedly connected to the container base is mechanically connected to a positioning component that positions the frame supporting pin that supports the pellicle; and an elastic member is disposed on the point of contact between the frame supporting pin that supports the pellicle and the pellicle frame. It is even more preferable that the container boase and the Icovering body are made of a plastic resin, and these have antistatic performance such that their surface resistivity is no higher than 1×1012 ohms.

Description

BACKGROUND OF THE INVENTION [0001] The present invention relates to a container box for holding, storing, and transporting a photolithographic pellicle used to shield it against dust deposition in the manufacturing process of semiconductor devices, printed circuit boards, liquid crystal display panels, and the like. [0002] In the manufacture of liquid crystal display panels, semiconductor devices such as integrated circuits, and others, a pattern is produced by light exposure of a semiconductor wafer or base glass plate for liquid crystal use, but if dust particles are deposited onto the photomask or reticle used here (hereinafter referred to simply as “photomask”), the dust particles will block or scatter the light, which is a problem in that the fidelity of patterning is lost. [0003] For this reason, this work is usually performed in a clean room, but, even in a clean room of the highest class, it is difficult to keep the photomask in a completely dust-free condition. This problem...

AI Technical Summary

Benefits of technology

[0019] The present invention was conceived in view of the above problems, and it is an object thereof to provide a photolithographic pellicle container with which no foreign particles will be deposited to the contained pellicle during storage, transportation, or operation, and contamination of the pellicle can be prevented to ensure keeping of the pellicle in a condition of good quality.

[0021] In the present invention, a pellicle frame can be securedly grasped while keeping contact points to the minimum, which reduces the likelihood of dust generation, and since the frame supporting pin is provided to a container body of increased rigidity, the pellicle is affected little by an external force. Further, in an embodiment in which the container base is made from a plastic resin and a metal component is joined to this container base, the light weight of the plastic resin can be taken advantage of while compensating for the distortion that is a drawback to plastic, allowing just the required portions to be capable of shape retention with respect to external forces.

[0022] In an embodiment in which a component that positions the frame supporting pin that supports the pellicle is mechanically connected to a metal component attached to the container base, the position of the pellicle can be kept constant during storage, transportation, and operation, which reduces generation of dust and deformation.

[0023] In an embodiment in which an elastic member is disposed at the part of the frame supporting pin supporting the pellicle that comes into contact with the pellicle frame, the influences of vibrations on the pellicle during storage, transportation, and operation can be reduced.

[0024] In an embodiment in which the container base and the covering body are both made from a plastic resin and antistatic performance is imparted such that their surface resisttivity is no higher than 1×1012 ohms, a foreign matter deposition prevention effect can be obtained, such as preventing static electricity that is produced by friction with a packaging bag, which can be a particular problem with a container of a pellicle for large liquid crystal display panels.

Problems solved by technology

In the manufacture of liquid crystal display panels, semiconductor devices such as integrated circuits, and others, a pattern is produced by light exposure of a semiconductor wafer or base glass plate for liquid crystal use, but if dust particles are deposited onto the photomask or reticle used here (hereinafter referred to simply as “photomask”), the dust particles will block or scatter the light, which is a problem in that the fidelity of patterning is lost.

For this reason, this work is usually performed in a clean room, but, even in a clean room of the highest class, it is difficult to keep the photomask in a completely dust-free condition.

Nevertheless, while a pellicle is indeed effective for preventing foreign matter from getting into the closed space formed by the photomask and pellicle once the pellicle has been applied, if any foreign matter has already deposited to the pellicle per se and is present inside the closed space, it becomes very difficult to prevent that foreign matter from being deposited to the photomask surface.

This problem is particularly serious with a pellicle for alarge size liquid crystal display panel whose length on one side is over 400 mm.

An advantage to a method such as that indicated in Japanese Laid-Open Patent Application 2000-173887, in which rigidity is increased by introducing a rib structure into the container body, is that there is little thermal deformation resulting from changes in the external air temperature during transportation by airplanes, trucks, or the like in a hot weather, but a drawback is that it is difficult to keep the distortion that occurs when the user takes up the container just at one end down in a cantilever manner to affect the pellicle.

If a high peel strength grade of release agent is used for the protective film to prevent this, it can lead to deformation of the pressure-sensitive adhesive when the protective film is peeled away from the adhesive, which is a problem in that when the pellicle is applied to a photomask, these deformed sites will not stick to the photomask, resulting in occurrence of an air passage.

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