Silane monomers and siloxane polymers for semiconductor optoelectronics
Patent Information
- Authority / Receiving Office
- US · United States
- Patent Type
- Applications(United States)
- Current Assignee / Owner
- SILECS OY
- Publication Date
- 2006-12-28
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
[0001] This application claims priority of U.S. Provisional Application for Patent Ser. No. 60 / 689,541 filed Jun. 13, 2005, which is incorporated herein by reference.BACKGROUND OF THE INVENTION
[0002] 1. Field of the Invention
[0003] The present invention relates to a method making novel organo fuictionalized silane precursors and polymers of the same that are applicable for thin films used for example as dielectrics in integrated circuits, optoelectronic applications and for other similar applications. In particular, the invention concerns first making an intermediate monomer and then converting the monomer to an organo functionalized silane monomer and finally forming a polymer or polymer compositions of the functionalized monomers. The invention also concerns a method for producing such films by preparing siloxane compositions by polymerization of the organo functionalized monomers, by applying the polymerized compositions on a substrate in the form of a layer and by curing the l...