Cleaning method used in removing contaminants from the surface of an oxide or fluoride comprising a group III B metal

a cleaning method and fluoride technology, applied in the direction of superimposed coating process, crystal growth process, transportation and packaging, etc., can solve the problems of insufficient corrosion resistance, insufficient useful in preventing, and insufficient compression of coating, etc., to achieve excellent plasma corrosion resistance

Inactive Publication Date: 2007-06-14
APPLIED MATERIALS INC
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  • Abstract
  • Description
  • Claims
  • Application Information

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Benefits of technology

[0016] We have determined that it is possible to use an aluminum alloy of the 2000 series or the 5000 through 7000 Series as a substrate in fabricating process chambers and processing components, where the aluminum alloy is protected by a plasma-resistant coating containing an oxide of Y, Sc, La, Ce, Eu, Dy, or the like, or a fluoride of one of these metals, or yttrium-aluminum-garnet (YAG). The coated aluminum alloy has excellent plasma corrosion-resistance over a lifetime which is extended at least two times, and as much as four times, over the lifetime of an aluminum alloy which is not protected by a coating of the present invention.
[0017] To provide the extended lifetime corrosion resistance described, it is necessary to place the coating in compression. This is accomplished by controlling deposition conditions during application of the coating. Placing the coating under adequate compression helps prevent mobile impurities in the aluminum alloy substrate from migrating from the substrate into the coating and causing defects in the coating which enable penetration of the coating by reactive species which are in contact with the exterior surface of the coating. Placing the coating under compression also increases the density of the coating. The increased density of the coating provides better protection from corrosive plasmas and improves the machinability of a substrate protected by the sprayed film. Porosity is an indicator of the density of the coating, i.e., the less porous the coating, the more dense the coating. Porosity is expressed as the percentage of open space in the total volume of the coating. Yttrium oxide coatings which have been applied according to the present method have a porosity of about 1.4%. Typically, yttrium oxide coatings are applied according to the present method under conditions which result in a yttrium oxide film having a compressive stress which is sufficient to provide a yttrium oxide film porosity of about 1.5% or less. In comparison, yttrium oxide coatings which were deposited using prior art methods typically have porosities within the range of about 3% to about 5%.

Problems solved by technology

When the upper surface of the aluminum alloy substrate to which the coating is applied is at a temperature of less than about 150-200° C., the coating will not be placed under adequate compression upon cooling to provide the desired corrosion resistance, and will not be sufficiently useful in acting to prevent particulates in the aluminum alloy substrate from migrating into the coating.

Method used

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  • Cleaning method used in removing contaminants from the surface of an oxide or fluoride comprising a group III B metal
  • Cleaning method used in removing contaminants from the surface of an oxide or fluoride comprising a group III B metal
  • Cleaning method used in removing contaminants from the surface of an oxide or fluoride comprising a group III B metal

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Embodiment Construction

[0040] As a preface to the detailed description, it should be noted that, as used in this specification and the appended claims, the singular forms “a”, “an”, and “the” include plural referents, unless the context clearly dictates otherwise.

[0041] Disclosed herein is a method of applying a plasma-resistant coating on an aluminum or an aluminum alloy substrate. The present method is particularly useful for applying a plasma-resistant coating to a substrate which comprises an aluminum alloy of the 2000 series or the 5000 through 7000 Series. Because of its greater malleability, 2000 series aluminum is particularly preferred when fabricating parts and components having complex shapes.

[0042] The plasma-resistant coating comprises an oxide of Y, Sc, La, Ce, Eu, Dy, or the like, or a fluoride of one of these metals, or yttrium-aluminum-garnet (YAG). An aluminum alloy coated with the coating of the invention applied by the method of the inventions shows excellent plasma corrosion-resista...

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Abstract

Disclosed herein is a cleaning method useful in removing contaminants from a surface of a coating which comprises an oxide or fluoride of a Group III B metal. Typically the coating overlies an aluminum substrate which is present as part of a semiconductor processing apparatus. The coating typically comprises an oxide or a fluoride of Y, Sc, La, Ce, Eu, Dy, or the like, or yttrium-aluminum-garnet (YAG). The coating may further comprise about 20 volume % or less of Al2O3.

Description

[0001] The present application is a divisional application of U.S. application Ser. No. 10 / 898,113, filed Jul. 22, 2004, and titled “Clean, Dense Yttrium Oxide Coating Protecting Semiconductor Processing Apparatus”, which is presently pending, and which is a continuation-in-part application of U.S. application Ser. No. 10 / 075,967, filed Feb. 14, 2002, and titled “Yttrium Oxide Based Surface Coating For Semiconductor IC Processing Vacuum Chambers”, which issued as U.S. Pat. No. 6,776,873 on Aug. 17, 2004.BACKGROUND OF THE INVENTION [0002] 1. Field of the Invention [0003] The present invention relates to equipment and apparatus used in the manufacture of electronic devices including semiconductor devices, MEM devices, and other devices used in data manipulation, storage, and display, for example and not by way of limitation. In particular, the invention pertains to the use of yttrium oxide-comprising protective layers which are applied to a surface of apparatus, such as process chambe...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): C23C16/00C23C14/00B05D1/08C23C16/44C23C28/00
CPCC23C16/4404C23C28/042Y10T428/26Y10S134/902C30B35/00C23C4/11C23C4/18C23C14/00
Inventor WANG, XIKUNXU, LISUN, JENNIFER Y.
Owner APPLIED MATERIALS INC
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