Lead frame and method for manufacturing the same
a lead frame and manufacturing method technology, applied in the field of lead frame, can solve the problems of increased cost, difficult peeling of leaked resin, leakage of resin, etc., and achieve the effect of improving adhesion, improving adhesion, and improving adhesion
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embodiment 1
[0044]Using a copper material having a thickness of 0.150 mm as the metal plate 1, a dry film resist (Asahi Kasei E-Materials Co., Ltd.: AQ-2058) was affixed to the both surfaces to form a resist layer. Then, by performing exposure and development using a glass mask for the upper surface side and the rear surface side on which a pattern for forming the plating is formed, the resist in the portions for plating is removed, to thereby form a plating mask that leaves the metal plate surface partially uncovered.
[0045]Next, a plating process was performed to form a plating on the uncovered portions of the metal plate surface. In this embodiment, Ni plating with a set value of 1.0 μm, Pd plating with a set value of 0.02 μm, and Au plating with a set value of 0.007 μm were applied in order from the metal plate side, to form a three-layered plating.
[0046]Next, the plating masks formed on both sides of the metal plate were peeled off with a 3% sodium hydroxide aqueous solution, and washing tr...
embodiment 2
[0051]A lead frame of Embodiment 2 was obtained in the same manner as in Embodiment 2 except that the film thickness of the electric Zn plating was 0.2 μm.
embodiment 3
[0052]A lead frame of Embodiment 3 was obtained in the same manner as in Embodiment 1 except that Sn plating was applied instead of Zn. This electric Sn plating bath contained 55 g / l of stannous sulfate, 100 g / l of sulfuric acid, 60 g / l of cresolsulfonic acid, 2 g / l of gelatin, and 1 g / l of (3-naphthol, and an electric Sn plating was carried out at a current density of 2 A / dm2, to obtain a Sn plating layer with a film thickness of 1 μm.
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