Process for forming and acoustically connecting structures on a substrate

a technology of acoustic connection and substrate, which is applied in the field of microelectromechanical systems (mems) devices, can solve the problems of slow forming of vents and small vent diameter, and achieve the effects of reducing the thickness of the back side of the substrate, reducing the thickness, and reducing the thickness

Inactive Publication Date: 2006-05-23
AKUSTICA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0005]The present invention is directed to a process comprising reducing the thickness of a back side of a substrate in an area where vents are to be formed. A micro-machined mesh is released from a top side of the substrate. A vent opening is formed that connects the released mesh and the area of reduced thickness. Several embodiments of the invention are disclosed. In one ...

Problems solved by technology

Forming of vents by this technique is slow in that several hundred microns of substrate may need to be etched to reach the chamber beneath the sealed mesh and the diameter of the vent is small compared to its depth.
Additionally, ...

Method used

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  • Process for forming and acoustically connecting structures on a substrate
  • Process for forming and acoustically connecting structures on a substrate
  • Process for forming and acoustically connecting structures on a substrate

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Embodiment Construction

[0026]A first embodiment of the present invention is illustrated in conjunction with FIGS. 1–9. In FIG. 1, a die 10 is received from a CMOS foundry. At the CMOS foundry, a silicon substrate 12 has been processed so as to form alternating layers of, for example, a dielectric material and a metal. The die 10 illustrated in FIG. 1 has a first layer of dielectric material 14 carrying a first metal layer 16. The first metal layer 16 has been patterned such that a portion thereof forms a micro-machined mesh 18. Formed on the first metal layer 16 is a second layer of dielectric 20. The second layer of dielectric 20 carries a second metal layer 22 which has been patterned to have an opening 24 formed therein. The second metal layer 22 carries a third layer of dielectric 26. The third layer of dielectric 26 carries a third layer of metal 28 which has been patterned to have an opening 30 formed therein. A top layer of dielectric 32 is formed on top of the third metal layer 28.

[0027]The presen...

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Abstract

The present invention describes a processes that builds an acoustic cavity, a chamber, and vent openings for acoustically connecting the chamber with the acoustic cavity. The dry etch processes may include reactive ion etches, which include traditional parallel plate RIE dry etch processes, advanced deep and inductively coupled plasma RIE processes. Three embodiments for connecting the chamber to the cavity from the top side of the substrate, e.g. by using pilot openings formed using at least a portion of the mesh as an etch mask, by forming the vent openings using at least a portion of the mesh as an etch mask, or by having the chamber intersect the vent openings as the chamber is being formed, illustrate how the disclosed process may be modified. By forming the cavity on the back side of the substrate, the depth of the vent holes is decreased. Additionally, using at least a portion of the micro-machined mesh as an etch mask for the vent holes makes the process self-aligning.

Description

BACKGROUND OF THE INVENTION[0001]The present invention is directed generally to micro-electromechanical Systems (MEMS) devices and, more particularly, to processes for forming chambers and cavities in a substrate and acoustically interconnecting such structures.[0002]The ability to form moving parts measured in microns has opened up a huge range of applications. Such moving parts typically take the form of a beam or mesh that may form, for example, a variable capacitor, switch, or other component. The recent ability to seal micro-machined meshes has lead to the fabrication of microphones and microspeakers. See, for example, International Publication No. WO / 01 / 20948 A2 published 22 Mar. 2001, entitled MEMS Digital-to-Acoustic Transducer With Error Cancellation, the entirety of which is hereby incorporated by reference.[0003]A sealed mesh can function as a movable plate of a variable capacitor, and therefore can operate as a microphone. For a sealed mesh to operate as a microspeaker, ...

Claims

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Application Information

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IPC IPC(8): G03C5/00B81C1/00B81B3/00H04R19/00
CPCA61K8/0208H04R19/005B81C1/00158A61K2800/33A61K2800/58A61K2800/72A61K2800/94B81B2201/0257A61K2800/75
Inventor GABRIEL, KAIGHAM J.ZHU, XU
Owner AKUSTICA
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