Exhaust gas purification device (100), comprising: a substrate (10) comprising an upstream end (I) through which an
exhaust gas is introduced into the device and a downstream end (J) through which the
exhaust gas is discharged from the device, wherein the substrate (10) has a length Ls between the upstream end (I) and the downstream end (J); a first catalyst layer (20) containing
palladium particles, which extends over a first region (X) and is in contact with the substrate (10), wherein the first region (X) extends between the upstream end (I) and a first position (P), wherein the first position (P) is located at a first distance La from the upstream end (I) in the direction of the downstream end (J); a second catalyst layer (30) containing
rhodium particles, which extends over a second region (Y) and is in contact with the substrate (10), wherein the second region (Y) extends between the downstream end (J) and a second position (Q), the second position (Q) being located at a second distance Lb from the downstream end (J) in the direction of the upstream end (I); and a third catalyst layer (40) containing
rhodium particles, which extends over a third region (Z) and is in contact with at least the first catalyst layer (20), wherein the third region (Z) extends between the upstream end (I) and a third position (R), wherein the third position (R) is located at a third distance Lc from the upstream end (I) in the direction of the downstream end (J), wherein a mean
particle size distribution of the
rhodium particles contained in the second catalyst layer (30) and the third catalyst layer (40) is from 1.0 nm to 2.0 nm, and a standard deviation of the
particle size distribution of the rhodium particles contained in the second catalyst layer (30) and the third catalyst layer (40) is 0.8 nm or less.