Semiconductor LED structure with high extracting efficiency and its preparing method
A technology for light-emitting diodes and extraction efficiency, which is applied in semiconductor devices, electrical components, circuits, etc., and can solve problems such as low extraction efficiency, low external quantum efficiency, and low LED light intensity
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[0031] 1) Preparing a red LED epitaxial wafer, that is, growing an N-type semiconductor 7, a multi-quantum well active region 6, a P-type semiconductor 5, and a GaP layer 4 sequentially on a substrate 8, and the uppermost semiconductor material of the LED epitaxial wafer is GaP layer 4;
[0032] 2) Put the sample cleaned with acetone, absolute ethanol and deionized water into the ITO electron beam evaporation station, grow an ITO transparent conductive film 3 with an optical thickness of 1 / 2 wavelength on the GaP layer 4, and the growth temperature is 190 ℃, the oxygen flow rate is 3sccm, and the evaporation rate is 0.2nm / s; (In the actual preparation process, according to the conditions of your own equipment, you can flexibly adjust the growth process parameters such as growth temperature and oxygen flow rate to prepare the required ITO transparent conductive film3);
[0033] 3) Use PECVD equipment to grow Si on the ITO transparent conductive film 3 x N y Dielectric film 2...
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