Method for manufacturing two-dimensional photonic crystals and photonic quasicrystalline
A technology of two-dimensional photonic crystals and photonic quasicrystals, which is applied in the manufacture of optics, optical components, semiconductors/solid-state devices, etc., can solve problems such as complicated procedures, long cycle times, and complicated processes, and achieve simple and easy preparation methods and improved light output. Efficiency, the effect of simplifying process steps
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Embodiment 1
[0052] In this embodiment, single-layer GaN is used as the processing object, and two-dimensional photonic crystals or photonic quasicrystals are fabricated by using the direct setting method in the FIB system.
[0053] The GaN material used in the example is epitaxially grown on a sapphire substrate by metal organic compound vapor deposition (MOCVD) technology.
[0054] The following are the detailed steps for preparing two-dimensional photonic crystals or photonic quasicrystals using the direct setting method in FIB technology:
[0055] 1) Fix the sample on the sample stage to ensure that the processing object and the sample stage have good electrical conductivity and mechanical stability, so as to prevent the negative impact on the processing accuracy caused by charge accumulation, charging and discharging or mechanical drift on the sample.
[0056] 2) In the processing area, directly draw the structure to be etched on the display interface of the FIB system, such as Figu...
Embodiment 2
[0062] In this embodiment, a single-layer GaN is used as a processing object, and a two-dimensional photonic crystal or a photonic quasicrystal is produced by a pattern conversion method in a FIB system.
[0063] The GaN material used in the example is a structure formed by epitaxial growth on a sapphire substrate by metal organic compound vapor deposition (MOCVD) technology.
[0064] The following are the detailed steps for preparing two-dimensional photonic crystals and photonic quasicrystals using the graphic conversion method in FIB technology:
[0065] 1) Fix the sample on the sample stage to ensure that the processing object and the sample stage have good electrical conductivity and mechanical stability, so as to prevent the negative impact on the processing accuracy caused by charge accumulation, charging and discharging or mechanical drift on the sample.
[0066] 2) Draw the graphics to be prepared with drawing software, save them as files in .BMP format, and then use ...
Embodiment 3
[0072] In this embodiment, single-layer GaN is used as the processing object, and the two-dimensional photonic crystal or photonic quasicrystal is fabricated by the pattern file method in the FIB system.
[0073] The GaN material used in the example is a structure formed by epitaxial growth on a sapphire substrate by metal organic compound vapor deposition (MOCVD) technology.
[0074] The following are the detailed steps for preparing two-dimensional photonic crystals and photonic quasicrystals using the pattern file method in FIB technology:
[0075]1) Fix the sample on the sample stage to ensure that the processing object and the sample stage have good electrical conductivity and mechanical stability, so as to prevent the negative impact on the processing accuracy caused by charge accumulation, charging and discharging or mechanical drift on the sample.
[0076] 2) Through programming software (such as: Delphi), program the coordinates of the point to be etched and the etchi...
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