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Method for manufacturing two-dimensional photonic crystals and photonic quasicrystalline

A technology of two-dimensional photonic crystals and photonic quasicrystals, which is applied in the manufacture of optics, optical components, semiconductors/solid-state devices, etc., can solve problems such as complicated procedures, long cycle times, and complicated processes, and achieve simple and easy preparation methods and improved light output. Efficiency, the effect of simplifying process steps

Inactive Publication Date: 2009-01-28
PEKING UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

These methods have many preparation steps, complicated process, complicated procedures, long cycle and great technical difficulty.

Method used

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  • Method for manufacturing two-dimensional photonic crystals and photonic quasicrystalline
  • Method for manufacturing two-dimensional photonic crystals and photonic quasicrystalline
  • Method for manufacturing two-dimensional photonic crystals and photonic quasicrystalline

Examples

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Embodiment 1

[0052] In this embodiment, single-layer GaN is used as the processing object, and two-dimensional photonic crystals or photonic quasicrystals are fabricated by using the direct setting method in the FIB system.

[0053] The GaN material used in the example is epitaxially grown on a sapphire substrate by metal organic compound vapor deposition (MOCVD) technology.

[0054] The following are the detailed steps for preparing two-dimensional photonic crystals or photonic quasicrystals using the direct setting method in FIB technology:

[0055] 1) Fix the sample on the sample stage to ensure that the processing object and the sample stage have good electrical conductivity and mechanical stability, so as to prevent the negative impact on the processing accuracy caused by charge accumulation, charging and discharging or mechanical drift on the sample.

[0056] 2) In the processing area, directly draw the structure to be etched on the display interface of the FIB system, such as Figu...

Embodiment 2

[0062] In this embodiment, a single-layer GaN is used as a processing object, and a two-dimensional photonic crystal or a photonic quasicrystal is produced by a pattern conversion method in a FIB system.

[0063] The GaN material used in the example is a structure formed by epitaxial growth on a sapphire substrate by metal organic compound vapor deposition (MOCVD) technology.

[0064] The following are the detailed steps for preparing two-dimensional photonic crystals and photonic quasicrystals using the graphic conversion method in FIB technology:

[0065] 1) Fix the sample on the sample stage to ensure that the processing object and the sample stage have good electrical conductivity and mechanical stability, so as to prevent the negative impact on the processing accuracy caused by charge accumulation, charging and discharging or mechanical drift on the sample.

[0066] 2) Draw the graphics to be prepared with drawing software, save them as files in .BMP format, and then use ...

Embodiment 3

[0072] In this embodiment, single-layer GaN is used as the processing object, and the two-dimensional photonic crystal or photonic quasicrystal is fabricated by the pattern file method in the FIB system.

[0073] The GaN material used in the example is a structure formed by epitaxial growth on a sapphire substrate by metal organic compound vapor deposition (MOCVD) technology.

[0074] The following are the detailed steps for preparing two-dimensional photonic crystals and photonic quasicrystals using the pattern file method in FIB technology:

[0075]1) Fix the sample on the sample stage to ensure that the processing object and the sample stage have good electrical conductivity and mechanical stability, so as to prevent the negative impact on the processing accuracy caused by charge accumulation, charging and discharging or mechanical drift on the sample.

[0076] 2) Through programming software (such as: Delphi), program the coordinates of the point to be etched and the etchi...

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Abstract

This invention discloses one method to process photon transistor or quartz particles, which comprises the following steps: a, on needs, designing circle 2D photon transistor or quartz photon circle structure; b, fixing the sample onto focus ion beam system bench to form good electrical touch and mechanic stability; c, generating photon transistor or quartz circle structure in process area; d, setting focus ion beam system work parameters and adjusting focus ion beam to get ion beam probe.

Description

technical field [0001] The invention relates to a method for preparing a two-dimensional photonic crystal or a photonic quasicrystal, in particular to a method for directly etching a light-emitting diode to form a two-dimensional photonic crystal or a photonic quasicrystal by applying the FIB technology. Background technique [0002] Photonic crystals are microstructured materials in which the refractive index of the medium changes periodically in the range of wavelength scales to generate photonic band gaps. Theory and experiments have confirmed that, just like using semiconductors to manipulate electrons, people can use photonic crystals to manipulate photons, thereby manufacturing various new micro- and nano-photonic devices. Quasicrystals are a new class of ordered structures with high-order rotational and linear symmetry but no translational symmetry. Photonic crystals composed of quasicrystals are photonic quasicrystals. The characteristics of the lattice arrangement ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B1/00H01L21/00
Inventor 章蓓代涛徐军
Owner PEKING UNIV