Making method for current induction wafer resistor
A chip resistance and manufacturing method technology, applied in the field of electromechanical, can solve the problems of low power, low conductivity and low precision, and achieve the effects of high power, high thermal conductivity and high precision
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[0010] As shown in Figure 2 and Figure 3, the resistor manufacturing process B of the present invention includes a pre-process C and a post-process D, wherein the pre-process C is to firstly coat the aluminum nitride (AlN) substrate C1 with a resistive masking layer Cloth C2, after coating C2 on the resistance masking layer, carry out vacuum coating C3 on the resistance layer, then remove the resistance masking layer C4 from the aluminum nitride (AlN) substrate C1, and after removing the resistance masking layer C4, then Coating C5 of the resistance protection layer, and after coating, electroplating C6 of the conductive layer on the aluminum nitride (AlN) substrate C1, and then performing laser grain separation and cutting C7, and entering the The step of post-process D;
[0011] In the post-process D, the aluminum nitride (AlN) substrate C1 is cut and adjusted by laser to adjust the resistance value D1 to adjust the accuracy of the resistance value, and then the resistance p...
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