A preparation method of visible light active nitrogen doping nanometer titania film
A nano-titanium dioxide and visible light technology, applied in chemical instruments and methods, chemical/physical processes, physical/chemical process catalysts, etc., can solve the problems of NH3 toxicity and achieve good visible light activity and simple process
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Embodiment 1
[0019] Embodiment 1: prepare titanium nitride thin film on the surface of Ti sheet by electrophoretic deposition method at room temperature, clean Ti sheet (thickness 0.1mm, area is 3.14cm 2 ) was fixed in the electrolytic cell, the potential of the potentiostat was adjusted to 10V, and the electrolyte was a suspension of titanium nitride containing 10g / L, and electrophoretic deposition was performed for 1 hour to obtain a golden yellow TiN thin film. The obtained TiN thin film was heat-treated at 350 °C in the air atmosphere, at which time TiN was transformed into nitrogen-containing TiO 2 The thin film exhibits good photoelectric response under visible light, which indicates its application in visible light photocatalysis and photo-splitting of water. Figure 2 shows nitrogen-containing TiO obtained by electrophoretic deposition of TiN 2 The open circuit voltage of the film, it can be seen that the photovoltage under white light and visible light is 2.8 and 1.2mV / mW.cm 2 . ...
Embodiment 2
[0020] Example 2: Prepare a titanium nitride film on the Ti surface by electrophoretic deposition at room temperature, and clean the Ti sheet (thickness 0.1mm, area is 3.14cm 2 ) is fixed in the electrolytic cell, and the opposite electrode adopts a metal Pt sheet, the potential of the potentiostat is adjusted to 10V, the distance between the electrodes is 1cm, and the titanium nitride suspension containing 10g / L is used for electrophoretic deposition for 2 hours to obtain yellow TiN thin film. The obtained TiN thin film was heat-treated at 350 °C in the air atmosphere, at which time TiN was transformed into nitrogen-containing TiO 2 thin film with photocurrents of 39.1 and 0.23 μA / cm under white light and visible light, respectively 2 As shown in Figure 4a and Figure 5a.
Embodiment 3
[0021] Example 3: Prepare a titanium nitride thin film on the Ti surface by electrophoretic deposition at room temperature, and clean the Ti sheet (thickness 0.1mm, area is 3.14cm 2 ) is fixed in the electrolytic cell, the opposite electrode is made of metal Pt sheet, the potential of the potentiostat is adjusted to 10V, the distance between the electrodes is 1cm, and the titanium nitride suspension containing 10g / L is used for electrophoretic deposition for 1 hour to obtain dark Yellow TiN film. The obtained TiN thin film was heat-treated at 350 °C in the air atmosphere, at which time TiN was transformed into nitrogen-containing TiO 2 thin film with photocurrents of 12.8 and 0.08 μA / cm under white light and visible light, respectively 2 . As shown in Figure 4b and Figure 5b.
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