Positive photoresist consumed reactive compound and light sensitive complexes thereof

A technology of photoactive compounds and polyphenol compounds, applied in optics, opto-mechanical equipment, instruments, etc., can solve the problems of high price and improve the efficiency of plate making

Active Publication Date: 2008-04-09
LUCKY HUAGUANG GRAPHICS
View PDF4 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

As the author stated in the book, although it is also found that 2,1,4-diazonaphthoquinone sulfonate compounds are used as solvent-inhibiting and promoting solvents for PS plates, they have very strong solubility-promoting properties after exposure, making PS plates developing tolerance The degree is greatly expanded, but because of the high price of 2,1,4-diazonaphthoquinone sulfonyl chloride, this photoactive compound is hardly used in PS plate making

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Positive photoresist consumed reactive compound and light sensitive complexes thereof
  • Positive photoresist consumed reactive compound and light sensitive complexes thereof
  • Positive photoresist consumed reactive compound and light sensitive complexes thereof

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0019]In the preparation of the photoactive compound of the present invention, 2,1,4-diazonaphthoquinone sulfonyl chloride with a purity of more than 99% and a decomposition point of more than 134°C is selected as the esterification reagent. Domestic Shanghai Saisi Photosensitive Material Co., Ltd. and Benxi Ruishida Chemical Co., Ltd. has sales. As the Ballast combined with 2,1,4-diazonaphthoquinone sulfonyl, although the commonly used Ballast of 2,1,5-diazonaphthoquinone sulfonate can be used, such as m-cresol formaldehyde resin, bisphenol A formaldehyde Resin, m-cresol p-cresol formaldehyde resin, pyrogallate acetonide resin, resorcinol acetonide resin, resorcinol cyclohexanide resin, benzil acid resorcinol resin, benzene Acid-shrinkable gallic acid resin, but the photoactive compounds synthesized by these Ballast have poor resistance to concentrated alkali, resulting in a decrease in image resolution and contrast (γ value), such as m-cresol formaldehyde resin and bisphenol...

Synthetic example 1

[0042] In a 1000ml flask equipped with a stirrer and a thermometer, add 100g (0.372mol) of 2,1,4-diazonaphthoquinonesulfonyl chloride (product of Shanghai Saisi Photosensitive Material Co., Ltd., decomposition point greater than 134°C) and 500g of dioxygen After the six rings are completely dissolved by stirring at room temperature, filter and transfer to a 2000ml four-necked flask equipped with a stirrer, a thermometer, and a dropping funnel. Then add BTB-16 resin (Weihai Tiancheng Chemical Co., Ltd.) 120g (1.062mol) and 600g dioxane in the dissolving device, after stirring and dissolving thoroughly at normal temperature, filter and transfer to the aforementioned four-necked flask. Then add 21.7g (0.205mol) of anhydrous sodium carbonate in the dissolving device, be made into the aqueous solution that concentration is 10% by weight, filter and transfer in the dropping funnel. Then place the four-necked flask in a water bath, the temperature of the water bath is controlled at a...

Synthetic example 2

[0044] With synthetic example 1 identical synthesis and separation and purification method, just replace 120g BTB-16 in synthetic example 1 with 120g (1.034mol) BTB-16M (Weihai Tiancheng Chemical Co., Ltd.), obtain product PAC-164M, yield and physical The chemical properties are listed in Table 1.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The present invention relates to light-activated compound indicated in below formula 1, wherein, each substituent and symbols are defined by a specification. The light-activated compound of the present invention is obtained from products by reaction and subsequently separation between 2, 1, 4-diazo naphthoquinone sulfonyl chlorine and Ballast in solvent when catalyst exists. The selection of the Ballast is mainly cresol and contains linear phenol resin or polyphenol compound formed by the condensation of at least one of phenol, o-cresol, m-cresol, o-chlorophenol or inter-chlorophenol and formaldehyde. Wherein, the content of the formaldehyde is 60 percent to 97 mol percent and the content of other phenol is 3 percent to 40 mol percent. A PS plate formed by coating of a photosensitive complex prepared by the light-activated compound of the present invention has excellent performance of plate making and imaging, and has better sensitivity and development latitude compared with the traditional PS plate. The light-activated compound of the present invention has favorable matching performance with the linear phenol resin of home and abroad renowned resin manufactures besides having the favorable matching performance with the nine kinds of film forming linear phenol resin of industrialized BTB-21-BTB-29.

Description

technical field [0001] The invention belongs to the technical category of photofunctional polymers or information recording materials, and in terms of application field, belongs to the technical category of preparation of photosensitive adhesives for printing plate making (PS plates) and VLSI photoresists and photosensitive complexes thereof . Background technique [0002] Since the invention of the diazonaphthoquinone series positive PS plate by the German Kalle company in 1933, a large amount of research has been carried out around the diazonaphthoquinone series photoactive compounds, and hundreds of valuable research reports have been made (Yonezawa Teruhiko, Introduction to PS version, Publishing Department of Printing Society of Japan, 1993), but until 1993, photoactive compounds mainly used 2,1,5-diazonaphthoquinone sulfonate system. As the author stated in the book, although it is also found that 2,1,4-diazonaphthoquinone sulfonate compounds are used as solvent-inhib...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/039
Inventor 余尚先丛培军戚其富王大伟顾江楠
Owner LUCKY HUAGUANG GRAPHICS
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap