Antenna and semiconductor device having the same
A technology for antennas and radio frequency identification devices, which is applied in the directions of antennas, loop antennas, antenna parts, etc., can solve the problems of current density distribution, magnetic field skew, response frequency, and communication distance, etc., to reduce line length, reduce response distance and response Inhomogeneity of frequency, effect of simple shape
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Embodiment approach 1
[0047] In this embodiment mode, one mode of the antenna of the present invention will be described with reference to the drawings.
[0048]As shown in FIG. 1 , the antenna shown in the present embodiment includes a substrate 100 , a conductive pattern 101 a , a conductive pattern 101 b , a feeding portion 102 , and a notch portion 103 . That is, the antenna shown in this embodiment has a region where the end of the conductive pattern 101a and the end of the conductive pattern 101b face each other. However, the substrate 100 may not be provided in some cases, and for example, the antenna may be constituted only by the conductive pattern 101a, the conductive pattern 101b, the feeding part 102, and the notch part 103.
[0049] The antenna of this embodiment is used in an electromagnetic induction system. In the electromagnetic induction method, changes in the magnetic field generated in the antenna are converted into electric currents. Therefore, by employing the loop antenna, ...
Embodiment approach 2
[0095] In this embodiment mode, a semiconductor device having the antenna shown in the above-mentioned embodiment mode will be described with reference to FIGS. 7A to 7C . Specifically, a case will be described in which an element layer (also referred to as an IC chip) having elements such as transistors is bonded to the antenna described in the above-mentioned embodiments to provide a semiconductor device. Note that in FIGS. 7A to 7C , FIG. 7B is an enlarged view of the region 120 in FIG. 7A , and FIG. 7C is a cross-sectional view taken along line a-b of FIG. 7B .
[0096] First, conductor patterns 101 a and 101 b serving as antennas, and power feeding portions 102 a and 102 b are formed on a substrate 100 . On the other hand, in addition to forming the antenna, an element layer 126 having elements such as transistors is also formed. As the antenna, any one of the antennas having the structures described in the above-mentioned embodiments may be used. In addition, the eleme...
Embodiment approach 3
[0103] In this embodiment mode, a method of manufacturing the semiconductor device described in Embodiment Mode 2 above will be described with reference to the drawings. Here, a case where an element layer is formed by disposing elements such as transistors on a flexible substrate will be described.
[0104] First, a release layer 702 is formed on one surface of a substrate 701, and then an insulating film 703 and an amorphous semiconductor film 704 (for example, a film containing amorphous silicon) serving as a base are formed (FIG. 8A). Note that the lift-off layer 702, the insulating film 703, and the amorphous semiconductor film 704 may be continuously formed.
[0105] As the substrate 701, a glass substrate, a quartz substrate, a substrate in which an insulating film is formed on one surface of a metal substrate or a stainless steel substrate, a plastic substrate having heat resistance to withstand the processing temperature of this step can be used. Bottom etc. In the ...
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