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Radiation sensitive resin composition, laminated insulating film, micro lens and preparation method thereof

A technology of resin composition and radiation, which is applied in the photoplate making process of patterned surface, photomechanical equipment, photosensitive materials used in photomechanical equipment, etc., can solve the problems of easy peeling and product yield problems, etc.

Active Publication Date: 2008-07-23
JSR CORPORATIOON
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] In addition, if the interlayer insulating film or microlens obtained in this way is formed in the development process, even if the development time is only a little longer than the optimum time, the developer will permeate between the pattern and the substrate, and peeling will easily occur. It is necessary to strictly control the development time, and there are problems in the yield of the product

Method used

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  • Radiation sensitive resin composition, laminated insulating film, micro lens and preparation method thereof
  • Radiation sensitive resin composition, laminated insulating film, micro lens and preparation method thereof
  • Radiation sensitive resin composition, laminated insulating film, micro lens and preparation method thereof

Examples

Experimental program
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preparation example Construction

[0085] Examples of the solvent used in the preparation of the copolymer [A] include alcohol, ether, glycol ether, ethylene glycol alkyl ether acetate, diethylene glycol ether, propylene glycol monoalkyl ether, propylene glycol alkyl Ether acetates, propylene glycol alkyl ether propionates, aromatics, ketones, esters, etc.

[0086] Specific examples of them include:

[0087] As alcohols, such as methanol, ethanol, benzyl alcohol, 2-phenylethanol, 3-phenyl-1-propanol, etc.;

[0088] As ethers, such as tetrahydrofuran, etc.;

[0089] As glycol ethers, such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, etc.;

[0090] As glycol alkyl ether acetates such as methyl cellosolve acetate, ethyl cellosolve acetate, ethylene glycol monobutyl ether acetate, ethylene glycol monoethyl ether acetate Esters, etc.;

[0091] Diethylene glycol, such as diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diglyme, diethylene glycol diethyl ether, diethy...

Embodiment

[0233] Hereinafter, synthesis examples and examples are given to describe the present invention more specifically, but the present invention is not limited to the following examples.

[0234] Synthesis example of copolymer [A]

Synthetic example 1

[0236] 7 parts by weight of 2,2'-azobis(2,4-dimethylvaleronitrile) and 200 parts by weight of diethylene glycol ethyl methyl ether were added to a flask equipped with a condenser and a stirrer. Then add 16 parts by weight of methacrylic acid, tricyclic methacrylic acid [5.2.1.0 2，6 ] 16 parts by weight of decane-8-yl ester, 20 parts by weight of 2-methylcyclohexyl acrylate, 40 parts by weight of glycidyl methacrylate, 10 parts by weight of styrene and α-methylstyrene dimer 3 parts by weight, and after nitrogen replacement, start to stir slowly. The temperature of the solution was raised to 70° C., and the temperature was maintained for 4 hours to obtain a polymer solution containing the copolymer [A-1].

[0237] The weight average molecular weight of the polymer was 8,000, and the molecular weight distribution (ratio of weight average molecular weight / number average molecular weight) was 2.3. In addition, the solid content concentration of the polymer solution obtained here ...

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Abstract

A radio-sensitized resin composition comprises a copolymer (A) of (a1), (a2) and (a3), 1,2-diazido quinone compound (B), and a siloxane oligomer (C) with functional group for performing cross linking reaction with the copolymer (A) by heat, wherein the (a1) is unsaturated carboxylic acid and / or unsaturated carboxylic acid anhydrides, the (a2) is unsaturated compound containing epoxy group and / or trimethylene oxide group, and the (a3) is unsaturated compound except the (a1) and (a2). The radio-sensitized resin composition with high rediation sensibility has development allowance for forming good pattern shape even though exceeding the optimal developing time during developing and can easily form pattern shaped film with excellent compliance.

Description

technical field [0001] The present invention relates to a radiation-sensitive resin composition, an interlayer insulating film, a microlens and their preparation methods. Background technique [0002] In electronic components such as thin-film transistor (hereinafter referred to as "TFT") liquid crystal display elements, magnetic head elements, integrated circuit elements, and solid-state imaging elements, an interlayer insulating film is generally provided to insulate interconnections arranged in layers. As the material for forming the interlayer insulating film, since it is preferable to obtain a necessary pattern shape with a small number of steps and a material with sufficient flatness, radiation-sensitive resin compositions are widely used (see Japanese Patent Laid-Open No. 2001-354822 and Japanese Patent Laid-Open No. 2001-343743). [0003] In the above-mentioned electronic components, for example, a TFT type liquid crystal display element is manufactured through the ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/008G03F7/004G03F7/00
Inventor 花村政晓内池千浩三谷浩司饭岛孝浩滨田谦一长屋胜也大泽友希
Owner JSR CORPORATIOON
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