High temperature heating vacuum evaporation film coating device

A technology of vacuum evaporation and high temperature heating, applied in vacuum evaporation coating, sputtering coating, ion implantation coating and other directions, can solve the problems of easy mutual pollution of evaporation materials, single evaporation chamber, affecting the purity of evaporated products, etc. Adhesion, simplified operating procedures, effect of increased temperature

Inactive Publication Date: 2008-08-20
UNIV OF ELECTRONICS SCI & TECH OF CHINA
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] In the existing traditional vacuum evaporation system, even if there are two or more evaporation sources, a single evaporation chamber is used. The disadvantage of this structure will make it easy for different evaporation materials to contaminate each other during the evaporation pro

Method used

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  • High temperature heating vacuum evaporation film coating device
  • High temperature heating vacuum evaporation film coating device
  • High temperature heating vacuum evaporation film coating device

Examples

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Embodiment 2

[0019] Example 2, such as Figure 4 As shown, the difference between this embodiment and Embodiment 1 is that the substrate holder base 6 is connected to the bell jar 10 through the manipulator 7, where the manipulator 7 is an inactive device, and is only used to fix the substrate holder. Base 6. A base 14 is provided below the base 1, a driving device is provided between the base 1 and the base 14, and a lifting and rotating device 12 is arranged in the driving device, which is used to control the base 1 and set on the base. The evaporation chamber on 1 rises and rotates, so that the evaporation chamber is in a closed state during the heating and evaporation process. The lifting and rotating devices described in this embodiment are both implemented in the prior art, so the internal structure thereof will not be described in detail here.

[0020] In order to be able to control the temperature in the evaporation chamber in real time, the present invention is also provided wit...

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Abstract

The invention relates to a vacuum evaporation coater with high temperature heating, belonging to the field of electromechanical technique. The invention comprises a bell jar, substrate clips and evaporating chambers which are positioned in a foundation bed. A heating device is arranged in the evaporating chamber. At least two groups of the substrate clips, the evaporating chambers and the heating device are prepared; each substrate clip is installed on the foundation bed of the substrate clip; the invention also comprises a driving device which drives the foundation beds of the substrate clip to relatively lift and rotate. The vacuum evaporation coater of the invention has the advantages that more than two different materials can be simultaneously evaporated and various materials can be successively evaporated by the substrate clips, thus avoiding cross contamination and ensuring the purity of evaporants, meanwhile, the vacuum evaporation coater can improve the utilization of the evaporants, save time, simplify operating procedure and enhance adhesive properties of substrates and evaporation materials.

Description

technical field [0001] The invention belongs to the technical field of electronic machinery, in particular to a vacuum evaporation coating device in the electronic thin film preparation technology. Background technique [0002] Vacuum evaporation coating is a method of heating the raw material to be formed in the evaporation container in a vacuum chamber, making its atoms or molecules gasify and escape from the surface, forming a vapor flow, incident on the solid surface, and condensing to form a solid film. The main physical process of vacuum coating method or vacuum coating method is produced by heating and evaporating materials, so it is also called thermal evaporation method. [0003] Generally speaking, compared with film-forming methods such as chemical vapor deposition and sputtering coating, vacuum evaporation has the following characteristics: simple equipment and easy operation; the produced film has high purity, good quality, and thickness can be controlled more a...

Claims

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Application Information

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IPC IPC(8): C23C14/26C23C14/54
Inventor 杨传仁张瑞婷张继华陈宏伟
Owner UNIV OF ELECTRONICS SCI & TECH OF CHINA
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