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Thin film support substrate for use in hydrogen production filter and production method of hydrogen production filter

一种制造方法、支持基板的技术，应用在化学仪器和方法、使用固体接触氢分离、膜技术等方向，能够解决不能充分地发挥过滤器耐久性、难以避免粘接剂劣化、氢气透过效率障碍等问题，达到提高氢气透过效率、提高氢气渗透效率、大氢气渗透面积的效果

Inactive Publication Date: 2009-01-07
DAI NIPPON PRINTING CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, it is necessary to remove the adhesive from the Pd alloy film located in the pores of the support, which brings about a problem that the manufacturing process is complicated.
In addition, since the reformer is used under high temperature and high pressure, it is difficult to avoid the deterioration of the adhesive, and the durability of the filter cannot be fully exerted.
[0010] Further, in order to maintain the desired strength of the support body, the size of the opening diameter of the hole that the support body has is limited, and furthermore, the expansion of the area of ​​the effective Pd alloy film for hydrogen penetration is also limited, which brings about the improvement of hydrogen gas. barriers to efficiency

Method used

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  • Thin film support substrate for use in hydrogen production filter and production method of hydrogen production filter
  • Thin film support substrate for use in hydrogen production filter and production method of hydrogen production filter
  • Thin film support substrate for use in hydrogen production filter and production method of hydrogen production filter

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0100] Fabrication of filters for hydrogen production

[0101] Prepare a SUS430 material with a thickness of 50 μm as a base material, and apply a photosensitive resist material (OFPR manufactured by Tokyo Ohka Industry Co., Ltd.) (film thickness 7 μm (when dry)) to both sides of the SUS430 material by dipping method, Next, a photomask in which a plurality of circular openings having an opening size (opening diameter) of 120 μm is arranged at a pitch of 200 μm is placed on the above-mentioned resist coating film, and the resist coating is applied through the photomask. The film was exposed and developed using sodium bicarbonate solution. In this way, a resist pattern having a circular opening with an opening size (opening diameter) of 120 μm was formed on both surfaces of the SUS430 material. In addition, the centers of the openings of the resist patterns formed on the respective surfaces were made uniform by the SUS430 material.

[0102] Then, using the above resist patte...

Embodiment 2

[0129] Fabrication of filters for hydrogen production

[0130] A SUS304 material with a thickness of 50 μm was prepared as a base material, and a photosensitive resist material (OFPR manufactured by Tokyo Ohka Kogyo Co., Ltd.) was applied (film thickness 7 μm (when dry)) to both sides of the SUS304 material by a dipping method. Next, a photomask in which a plurality of circular openings having an opening size (opening diameter) of 120 μm is arranged at a pitch of 200 μm is placed on the above-mentioned resist coating film, and the resist coating is applied through the photomask. The film was exposed and developed using sodium bicarbonate solution. In this way, a resist pattern with circular openings having an opening size (opening diameter) of 120 μm was formed on both surfaces of the SUS304 material. In addition, the centers of the openings of the resist patterns formed on the respective surfaces were made uniform by the SUS304 material.

[0131] Next, using the above res...

Embodiment 3

[0154] Fabrication of filters for hydrogen production

[0155] In the same manner as in Example 2, a plurality of through holes were formed in the SUS304 material to obtain a conductive base material.

[0156] Next, Ni strike plating (thickness: 0.01 μm) was performed on the above-mentioned SUS304 material under the following conditions, and then resin parts (AZ111 manufactured by Shipley Co., Ltd.) were filled in the through-holes of the above-mentioned SUS304 material. The filling of these resin parts is carried out by means of grouting. (The above is the filling process)

[0157] (Conditions for Ni strike plating)

[0158] ·Electroplating solution composition: nickel chloride......300g / L

[0159] Boric acid ......30g / L

[0160] PH: 2

[0161] ·Liquid temperature: 55~65℃

[0162] ·Current density: 10A / dm 2

[0163] Next, the following pretreatment is performed on one surface of the SUS304 material filled with the resin component in the through hole, a...

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Abstract

The present invention relates to a method for manufacturing a hydrogen production filter. The thin film support substrate for the filter comprises a metal substrate; a plurality of cylindrical convex parts on one surface of the metal substrate; and a plurality of through holes formed on the cylindrical convex part non-forming portions and passing through the metal substrate. The area of the cylindrical convex part non-forming portions is 20% to 90% of the area of the cylindrical convex part forming surface. The manufacturing method comprises: a resin layer forming process, in which a resin layer is formed on the cylindrical convex part forming surface on the thin film support substrate, fills up the interior of the through holes and covers the cylindrical convex parts; a flattening process, in which the resin layer is flat removed to expose the upper end surface of the cylindrical convex parts and form a plane with the upper end surface; a base layer forming process, in which a conductive base layer is formed on the flatted surface formed by the upper end surface of the cylindrical convex parts and the resin layer by using any one of the electroless film forming method and vacuum film forming method; a film forming process, in which a Pd alloy film is formed by plating on the surface of the conductive base layer; and a removal process, in which only the resin layer is dissolved and removed.

Description

technical field [0001] The present invention relates to a method for manufacturing a filter for hydrogen production, in particular to a method for producing a filter for hydrogen production by steam reforming various hydrocarbon fuels to generate hydrogen-rich gas for fuel cells. [0002] In addition, it relates to a filter for hydrogen production, and in particular to a thin film support substrate for a hydrogen production filter that converts various hydrocarbon fuels into a hydrogen-rich gas to generate hydrogen-rich gas for fuel cells, and This supporting thin film supporting substrate is used in a method of manufacturing a filter for hydrogen production. Background technique [0003] In recent years, from the viewpoint of global environmental protection, there has been concern about the generation of global warming gases such as carbon dioxide, and the use of hydrogen as a fuel has attracted attention due to its high energy efficiency. In particular, fuel cells are als...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01D71/02B01D69/10B01D69/12C01B3/56C25D1/00H01M8/06
CPCY02E60/50
Inventor 八木裕前田高德太田善纪内田泰弘
Owner DAI NIPPON PRINTING CO LTD
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