Phase-changing storage device and manufacture method thereof
A technology of phase change memory and manufacturing method, applied in static memory, digital memory information, information storage and other directions, can solve problems such as insufficient filling of gaps and insufficient filling
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[0048] first embodiment
[0049] Please refer to Figure 2a , which shows the top view of the manufacturing process of the phase change memory device according to the first embodiment of the present invention; please refer to Figure 2b , which shows a cross-sectional view of the manufacturing process of the phase change memory device according to the first embodiment of the present invention. A substrate 300 is provided, and the substrate 300 is a silicon substrate. In other embodiments, silicon germanium (SiGe), bulk semiconductor, strained semiconductor, compound semiconductor, silicon on insulator (SOI) or Other commonly used semiconductor substrates. The substrate 300 may also be a substrate including electronic components including transistors, diodes, bipolar junction transistors (BJTs), resistors, capacitors, inductors, and the like. Next, for example, physical vapor deposition (PVD), sputtering, low pressure chemical vapor deposition (LPCVD) and atomic layer chemi...
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[0068] Second Embodiment
[0069] Please refer to Figure 16a and 16b , which shows the formation of the cup-shaped opening 318 in the second embodiment of the present invention, wherein the element is Figure 2a , 2b For the same parts shown in ~6a and 6b, reference may be made to the previous related descriptions, and the repeated descriptions are not repeated here. use Figure 6a , 6b Hard mask layer 310a and photoresist layer 316 are shown as etch hard masks, and an anisotropic etch step is performed to remove portions of dielectric layer 304 until switching element 308 is exposed. Next, the photoresist layer 316 may be removed using a PR stripping process such as photoresist asher. Then, the hard mask layer 310 a may be removed by dry etching or wet etching to form a cup-shaped opening 318 , the bottom of which is overlapped and aligned above the switching element 308 . In the embodiment of the present invention, the etching selectivity ratio of the hard mask layer...
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