Method for preparing single structure ferricyanide film using single-stage pulse electrodeposition
A unipolar pulse and cyanide technology, applied in the direction of circuits, electrical components, electrolytic inorganic material coatings, etc., can solve the problems of unstable composition and structure of MHCF films, poor uniformity and stability, and achieve excellent selectivity and sensitivity , The preparation process is simple and the effect of strong controllability
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Embodiment 1
[0012] Take a platinum sheet as the working electrode, a large-area platinum sheet or a platinum mesh as the counter electrode, and a saturated calomel electrode as the reference electrode. -1 Potassium ferricyanide, 0.002mol L -1 Nickel sulfate and 0.25mol L -1 After applying a constant pulse deposition voltage of 0.2V (vs. SCE) for a certain period of time in the solution of sodium sulfate, the current is controlled to be zero within the cut-off time for unipolar pulse electrodeposition, and the pulse frequency is controlled at 5 / s and the pulse on-off time ratio t on / t off 1:1, pulse deposition 2000 times, on the surface of platinum substrate made "insoluble" structure of nickel ferricyanide thin film. at 1mol L -1 KNO 3 After cyclic scanning in the solution, the composition ratio of the film in the oxidized state was measured as: K:Ni:Fe=0.01:1.44:1.
Embodiment 2
[0014] Take a platinum sheet as the working electrode, a large-area platinum sheet or a platinum mesh as the counter electrode, and a saturated calomel electrode as the reference electrode. -1 Potassium ferricyanide, 0.004mol L -1 Nickel nitrate and 0.25mol L -1 After applying a constant pulse deposition voltage of 0.6V (vs. SCE) for a certain period of time in the solution of sodium nitrate, control the current to zero within the cut-off time for unipolar pulse electrodeposition, control the pulse frequency 2 / s, and the pulse on-off time ratio t on / t off 1.5:1, pulse deposition 3000 times, on the surface of the platinum substrate made of "soluble" structure of nickel ferricyanide thin film. at 1mol L -1 KNO 3 The composition ratio of the film in the oxidized state measured after circular scanning in the solution is: K:Ni:Fe=1.12:1.08:1.
Embodiment 3
[0016] Conductive glass was used as the working electrode, a large-area platinum sheet or platinum mesh was used as the counter electrode, and a saturated calomel electrode was used as the reference electrode. -1 Potassium ferricyanide, 0.01mol·L -1 Nickel chloride and 0.5mol L -1 After applying a constant pulse deposition voltage of 0.6V (vs. SCE) for a certain period of time in the solution of potassium nitrate, control the current to zero within the cut-off time for unipolar pulse electrodeposition, control the pulse frequency 3 / s, and the pulse on-off time ratio t on / t off 3:1, pulse deposition 5000 times, on the surface of the graphite substrate, the nickel ferricyanide film with "insoluble" structure was prepared. at 1mol L -1 KNO 3 The cyclic voltammogram in the solution is a single peak (0.41V low potential peak), which corresponds to the "insoluble" structure of the film.
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