Method for preparing nano CMOS integrated circuit by micro process
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- XIDIAN UNIV
- Publication Date
- 2010-06-02
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The invention belongs to the technical field of semiconductor integrated circuits, and in particular relates to a method for manufacturing nanoscale Si integrated circuits by using the existing micron-scale Si integrated circuit manufacturing process. Background technique
[0002] Information technology is the core technology of the national economy. It serves all fields of the national economy. Microelectronics technology is the key to information technology, and integrated circuits are the key among the keys. Since the advent of integrated circuits in 1958, they have developed at an astonishing speed. They have become the core of information science and technology, the cornerstone of national economic development and national defense construction, and have had a huge impact on world politics, economy and culture. As the fastest-growing, most influential, and most widely used technology in human history, integrated circuits have become an important in...